Journal of the Korean Ceramic Society (한국세라믹학회지)

The Korean Ceramic Society (한국세라믹학회)
권호 표지
DOI QR코드

DOI QR Code

Effect of Working Pressure and Substrate Bias on Phase Formation and Microstructure of Cr-Al-N Coatings

  • Choi, Seon-A (Department of Engineering Ceramic Center, Korea Institute of Ceramic and Engineering Technology) ;
  • Kim, Seong-Won (Department of Engineering Ceramic Center, Korea Institute of Ceramic and Engineering Technology) ;
  • Lee, Sung-Min (Department of Engineering Ceramic Center, Korea Institute of Ceramic and Engineering Technology) ;
  • Kim, Hyung-Tae (Department of Engineering Ceramic Center, Korea Institute of Ceramic and Engineering Technology) ;
  • Oh, Yoon-Suk (Department of Engineering Ceramic Center, Korea Institute of Ceramic and Engineering Technology)
  • Received : 2017.08.07
  • Accepted : 2017.09.28
  • Published : 2017.11.30
Download PDF
⟨ Previous Next ⟩

Abstract

With different working pressures and substrate biases, Cr-Al-N coatings were deposited by hybrid physical vapor deposition (PVD) method, consisting of unbalanced magnetron (UBM) sputtering and arc ion plating (AIP) processes. Cr and Al targets were used for the arc ion plating and the sputtering process, respectively. Phase analysis, and composition, binding energy, and microstructural analyses were performed using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and field emission scanning electron microscopy (FESEM), respectively. Surface droplet size of Cr-Al-N coatings was found to decrease with increasing substrate bias. A decrease of the deposition rate of Cr-Al-N films was expected due to the increase of substrate bias. The coatings were grown with textured CrN phase and (111), (200), and (220) planes. X-ray diffraction data show that all Cr-Al-N coatings shifted to lower diffraction angles due to the addition of Al. The XPS results were used to determine the $Cr_2N$, CrN, and (Cr,Al)N binding energies. The compositions of the Cr-Al-N films were measured by XPS to be Cr 23.2~36.9 at%, Al 30.1~40.3 at%, and N 31.3~38.6 at%.

Keywords

References

  1. S. Veprek and M. J. Veprek-Heijman, "Industrial Applications of Superhard Nanocomposite Coatings," Surf. Coat. Technol., 202 [21] 5063-73 (2008). https://doi.org/10.1016/j.surfcoat.2008.05.038
  2. Y. Chim, X. Ding, X. Zeng, and S. Zhang, "Oxidation Resistance of TiN, CrN, TiAlN and CrAlN Coatings Deposited by Lateral Rotating Cathode Arc," Thin Solid Films, 517 [17] 4845-49 (2009). https://doi.org/10.1016/j.tsf.2009.03.038
  3. K.-D. Bouzakis, N. Michailidis, S. Gerardis, G. Katirtzoglou, E. Lili, M. Pappa, M. Brizuela, A. Garcia-Luis, and R. Cremer, "Correlation of the Impact Resistance of Variously Doped CrAlN PVD Coatings with their Cutting Performance in Milling Aerospace Alloys," Surf. Coat. Technol., 203 [5] 781-85 (2008). https://doi.org/10.1016/j.surfcoat.2008.08.009
  4. S. Zhang, L. Wang, Q. Wang, and M. Li, "A Superhard CrAlSiN Superlattice Coating Deposited by Multi-Arc Ion Plating: I. Microstructure and Mechanical Properties," Surf. Coat. Technol., 214 160-67 (2013). https://doi.org/10.1016/j.surfcoat.2012.05.144
  5. J. Romero, M. Gomez, J. Esteve, F. Montalà, L. Carreras, M. Grifol, and A. Lousa, "CrAlN Coatings Deposited by Cathodic Arc Evaporation at Different Substrate Bias," Thin Solid Films, 515 [1] 113-17 (2006). https://doi.org/10.1016/j.tsf.2006.01.061
  6. E. Spain, J. Avelar-Batista, M. Letch, J. Housden, and B. Lerga, "Characterisation and Applications of Cr-Al-N Coatings," Surf. Coat. Technol., 200 1507-13 (2005). https://doi.org/10.1016/j.surfcoat.2005.08.086
  7. X.-Z. Ding and X. Zeng, "Structural, Mechanical and Tribological Properties of CrAlN Coatings Deposited by Reactive Unbalanced Magnetron Sputtering," Surf. Coat. Technol., 200, 1372-76 (2005). https://doi.org/10.1016/j.surfcoat.2005.08.072
  8. Z. Li, P. Munroe, Z.-T. Jiang, X. Zhao, J. Xu, Z.-F. Zhou, J.-Q. Jiang, F. Fang, and Z.-H. Xie, "Designing Superhard, Self-Toughening CrAlN Coatings through Grain Boundary Engineering," Acta Mater., 60, 5735-44 (2012). https://doi.org/10.1016/j.actamat.2012.06.049
  9. J. Lin, B. Mishra, J. Moore, and W. Sproul, "Microstructure, Mechanical and Tribological Properties of Cr1-xAlxN Films Deposited by Pulsed-Closed Field Unbalanced Magnetron Sputtering (P-CFUBMS)," Surf. Coat. Technol., 201 [7] 4329-34 (2006). https://doi.org/10.1016/j.surfcoat.2006.08.090
  10. H. C. Barshilia, N. Selvakumar, B. Deepthi, and K. Rajam, "A Comparative Study of Reactive Direct Current Magnetron Sputtered CrAlN and CrN Coatings," Surf. Coat. Technol., 201 [6] 2193-201 (2006). https://doi.org/10.1016/j.surfcoat.2006.03.037
  11. D. M. Mattox, Handbook of Physical Vapor Deposition (PVD) Processing; pp. 384-405, Elsevier, New Mexico, 2010.
  12. S.-Y. Chun, "Microstructure and Mechanical Properties of Nanocrystalline TiN Films through Increasing Substrate Bias," J. Korean Ceram. Soc., 47 [6] 479-84 (2010). https://doi.org/10.4191/KCERS.2010.47.6.479
  13. H. W. Ryu, G. P. Choi, W.-S. Noh, Y.-J. Park, and J. S. Park, "Effect of Oxygen Flow Ratio on the Crystallographic Orientation of NiO Thin Films Deposited by RF Magnetron Sputtering," J. Korean Ceram. Soc., 41 [2] 106-10 (2004). https://doi.org/10.4191/KCERS.2004.41.2.106
  14. J. Musil and S. Kadlec, "Reactive Sputtering of TiN Films at Large Substrate to Target Distances," Vacuum, 40 [5] 435-44 (1990). https://doi.org/10.1016/0042-207X(90)90241-P
  15. S.-K. Tien, C.-H. Lin, Y.-Z. Tsai, and J.-G. Duh, "Effect of Nitrogen Flow on the Properties of Quaternary CrAlSiN Coatings at Elevated Temperatures," Surf. Coat. Technol., 202 [4] 735-39 (2007). https://doi.org/10.1016/j.surfcoat.2007.06.042
  16. T. Elangovan, P. Kuppusami, R. Thirumurugesan, V. Ganesan, E. Mohandas, and D. Mangalaraj, "Nanostructured CrN Thin Films Prepared by Reactive Pulsed DC Magnetron Puttering," Mater. Sci. Eng., B, 167 [1] 17-25 (2010). https://doi.org/10.1016/j.mseb.2010.01.021
  17. M. Egawa, K. I. Miura, M. Yokoi, and I. Ishigami, "Effects of Substrate Bias Voltage on Projection Growth in Chromium Nitride Films Deposited by Arc Ion Plating," Surf. Coat. Technol., 201 [9] 4873-78 (2007). https://doi.org/10.1016/j.surfcoat.2006.07.076
  18. E. Fornies, R. E. Galindo, O. Sanchez, and J. Albella, "Growth of CrNx Films by DC Reactive Magnetron Sputtering at Constant $N_2/Ar$ Gas Flow," Surf. Coat. Technol., 200 [20] 6047-53 (2006). https://doi.org/10.1016/j.surfcoat.2005.09.020
  19. J. Bujak, J. Walkowicz, and J. Kusinski, "Influence of the Nitrogen Pressure on the Structure and Properties of (Ti, Al)N Coatings Deposited by Cathodic Vacuum Arc PVD Process," Surf. Coat. Technol., 180, 150-57 (2004).
  20. C. Gautier and J. Machet, "Study of the Growth Mechanisms of Chromium Nitride Films Deposited by Vacuum ARC Evaporation," Thin Solid Films, 295 [1-2] 43-52 (1997). https://doi.org/10.1016/S0040-6090(96)09164-X
  21. M. Li and F. Wang, "Effects of Nitrogen Partial Pressure and Pulse Bias Voltage on (Ti,Al)N Coatings by Arc Ion Plating," Surf. Coat. Technol., 167 [2] 197-202 (2003). https://doi.org/10.1016/S0257-8972(02)00895-2
  22. J.-W. Lee, S.-K. Tien, and Y.-C. Kuo, "The Effects of Pulse Frequency and Substrate Bias to the Mechanical Properties of CrN Coatings Deposited by Pulsed DC Magnetron Sputtering," Thin Solid Films, 494 [1] 161-67 (2006). https://doi.org/10.1016/j.tsf.2005.07.190
  23. X. Wan, S. Zhao, Y. Yang, J. Gong, and C. Sun, "Effects of Nitrogen Pressure and Pulse Bias Voltage on the Properties of Cr-N Coatings Deposited by Arc Ion Plating," Surf. Coat. Technol., 204 [11] 1800-10 (2010). https://doi.org/10.1016/j.surfcoat.2009.11.021
  24. K.-L. Chang, S.-C. Chung, S.-H. Lai, and H.-C. Shih, "The Electrochemical Behavior of Thermally Oxidized CrN Coatings Deposited on Steel by Cathodic Arc Plasma Deposition," Appl. Surf. Sci., 236 [1] 406-15 (2004). https://doi.org/10.1016/j.apsusc.2004.05.024
  25. M. Huang, G. Lin, Y. Zhao, C. Sun, L. Wen, and C. Dong, "Macro-Particle Reduction Mechanism in Biased Arc Ion Plating of TiN," Surf. Coat. Technol., 176 [1] 109-14 (2003). https://doi.org/10.1016/S0257-8972(03)00017-3
  26. J. J. Wu and R. J. Miller, "Measurements of Charge on Submicron Particles Generated in a Sputtering Process," J. Appl. Phys., 67 [2] 1051-54 (1990). https://doi.org/10.1063/1.345790
  27. A. Melzer, T. Trottenberg, and A. Piel, "Experimental Determination of the Charge on Dust Particles Forming Coulomb Lattices," Phys. Lett. A, 191 [3-4] 301-8 (1994). https://doi.org/10.1016/0375-9601(94)90144-9
  28. R. Boxman and S. Goldsmith, "Macroparticle Contamination in Cathodic Arc Coatings: Generation, Transport and Control," Surf. Coat. Technol., 52 [1] 39-50 (1992). https://doi.org/10.1016/0257-8972(92)90369-L
  29. Y. Chunyan, T. Linhai, W. Yinghui, W. Shebin, L. Tianbao, and X. Bingshe, "The Effect of Substrate Bias Voltages on Impact Resistance of CrAlN Coatings Deposited by Modified Ion Beam Enhanced Magnetron Sputtering," Appl. Surf. Sci., 255 [7] 4033-38 (2009). https://doi.org/10.1016/j.apsusc.2008.10.089
  30. H.-S. Jang, Y.-S. Kim, J.-H. Lee, H.-G. Chun, Y.-Z. You, and D.-I. Kim, "Effect of Substrate Bias Voltage on the Growth of Chromium Nitride Films," Korean J. Mater. Res., 17 [11] 618-21 (2007). https://doi.org/10.3740/MRSK.2007.17.11.618
  31. I.-W. Park, D. S. Kang, J. J. Moore, S. C. Kwon, J. J. Rha, and K. H. Kim, "Microstructures, Mechanical Properties, and Tribological Behaviors of Cr-Al-N, Cr-Si-N, and Cr-Al-Si-N Coatings by a Hybrid Coating System," Surf. Coat. Technol., 201 [9] 5223-27 (2007). https://doi.org/10.1016/j.surfcoat.2006.07.118
  32. J. Pelleg, L. Zevin, S. Lungo, and N. Croitoru, "Reactive-Sputter-Deposited TiN Films on Glass Substrates," Thin Solid Films, 197 [1-2] 117-28 (1991). https://doi.org/10.1016/0040-6090(91)90225-M

Cited by

  1. Cr-Al-N 코팅의 마찰마모 특성에 미치는 공정압력과 바이어스 전압의 영향 vol.50, pp.6, 2017, https://doi.org/10.5695/jkise.2017.50.6.473
  2. Structure and Properties of AlCrN Coatings Deposited Using Cathodic Arc Evaporation vol.10, pp.8, 2017, https://doi.org/10.3390/coatings10080793