Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
권호 표지
DOI QR코드

DOI QR Code

Characteristics of ZnO Multi-Layer Film Fabricated by Electrodeposition Method

전착법으로 제작한 ZnO 다층박막 제작과 특성 분석

  • Lee, Haeng Ja (Department of Convergence Science and Technology, Dong-A University) ;
  • Park, Kyung Hee (Department of Convergence Science and Technology, Dong-A University) ;
  • Kim, Jong Min (Department of Chemical Engineering, Dong-A University) ;
  • Chang, Sang Mok (Department of Convergence Science and Technology, Dong-A University)
  • 이행자 (동아대학교 융합과학기술학과) ;
  • 박경희 (동아대학교 융합과학기술학과) ;
  • 김종민 (동아대학교 공과대학 화학공학과) ;
  • 장상목 (동아대학교 융합과학기술학과)
  • Received : 2017.10.10
  • Accepted : 2017.10.17
  • Published : 2017.11.01
Download PDF
⟨ Previous Next ⟩

Abstract

Effective surface area and morphology of a sensitive thin film are important factors for its applications in sensor systems for the analysis of physical properties. In this study, we investigated the morphologies, electrochemical properties, and applicability of zinc oxide multilayer thin films fabricated by electrodeposition and annealing. The microstructure and electrochemical properties of the zinc oxide films were dependent on temperature and applied voltage. The best characteristics were obtained at an applied voltage of -1.4 V and a temperature of $50^{\circ}C$. The morphologies also changed upon annealing. The results suggest that the zinc oxide films fabricated by electrodeposition and annealing can be applied as various sensor materials.

Keywords

References

  1. G. Decher and J. D. Hong, Macromol. Symp., 46, 321 (1991). [DOI: https://doi.org/10.1002/masy.19910460145]
  2. P. Podsiadlo, A. K. Kaushik, E. M. Arruda, A. M. Waas, B. S. Shim, J. Xu, H. Nandivada, B. G. Pumplin, J. Lahann, A. Ramamoorthy, and N. A. Kotov, Science, 318, 80 (2007). [DOI: https://doi.org/10.1126/science.1143176]
  3. J. X. Wang, X. W. Sun, A. Wei, Y. Lei, X. P. Cai, C. M. Li, and Z. L. Dong, Appl. Phys. Lett., 88, 233106 (2006). [DOI: https://doi.org/10.1063/1.2210078]
  4. L. W. Ji, S. M. Peng, Y. K. Su, S. J. Young, C. Z. Wu, and W. B. Cheng, Appl. Phys. Lett., 94, 203106 (2009). [DOI: https://doi.org/10.1063/1.3141447]
  5. M. Izaki and T. Omi, J. Electrochem. Soc., 143, L53 (1996). [DOI: https://doi.org/10.1149/1.1836529]
  6. M. Izaki and T. Omi, Appl. Phys. Lett., 68, 2439 (1996). [DOI: https://doi.org/10.1063/1.116160]