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Advanced IGBT structure for improved reliability

신뢰성 개선된 IGBT 소자 신구조

  • Lee, Myoung Jin (School of Electronics and Computer Engineering, Chonnam National University)
  • 이명진 (전남대학교 전자컴퓨터공학부)
  • Received : 2017.09.21
  • Accepted : 2017.10.25
  • Published : 2017.10.31

Abstract

The IGBT structure developed in this paper is used as a high power switch semiconductor for DC transmission and distribution and it is expected that it will be used as an important electronic device for new and long distance DC transmission in the future by securing fast switching speed and improved breakdown voltage characteristic. As a new type of next generation power semiconductors, it is designed to improve the switching speed while at the same time improving the breakdown voltage characteristics, reducing power loss characteristics, and achieving high current density advantages at the same time. These improved properties were obtained by further introducing SiO2 into the N-drift region of the Planar IGBT and were compared and analyzed using the Sentaurus TCAD simulation tool.

본 논문에서 개발된 IGBT 구조는 DC 송배전을 위한 고전력 스위치 반도체로서 사용되며, 빠른 스위칭 속도 및 개선된 항복전압 특성을 확보하여, 향후 신재생 장거리 DC 송전을 위한 중요한 전자 소자로서 이용될 것이 기대되고 있다. 새로운 타입의 차세대 전력 반도체로서, 스위칭 속도를 향상시키면서 동시에 항복 전압의 특성을 개선시켜, 전력 손실 특성을 줄이도록 설계되었고, 높은 전류 밀도의 장점을 동시에 획득 가능하다. 이러한 개선된 특성은 Planar IGBT의 N-drift 영역에 $SiO_2$를 추가로 도입함으로서 얻어지며, Sentaurus TCAD 시뮬레이션 툴을 사용하여, 비교 분석하였다.

Keywords

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