참고문헌
-
A. Shah, M. Vanecek, J. Meier, F. Meillaud, J. Guillet, D. Fischer, C. Droz, X. Niquille, S. Fay, E. Vallat-Sauvain, V. T. -Daudrix, and J. Bailat, "Basic Efficiency Limits, Recent Experiments Results and Novel Light-Trapping in a-Si:H,
${\mu}c$ -Si:H and Micromorph Tandem Solar Cells", J. Non-Cryst. Solids 639, (2004) 338. - M. Jacoby, "The future of low-cost solar cells", Chem. Eng. News 94 (18), (2016) 30.
- O. Isabella, J. Krc, and M. Zeman, "Modulated surface textures for enhanced light trapping in thin-film silicon solar cells", Appl. Phys. Lett. 97, (2010) 10110.
- X. Yan, S. Venkataraj, and A. G. Aberle, "Modulated surface texturing of Aluminum-Doped Zinc Oxide (AZ)) Transparent Conductive Oxides for Thin-Film Silicon Solar Cells", Energy Procedia 33, (2013) 157. https://doi.org/10.1016/j.egypro.2013.05.053
- W. Zhang, U. W. Paetzold, M. Meier, A. Gordijn, J. Hupkes, and T. Merdzhanova, "Thin-film Silicon Solar Cells on Dry Etched Textured Glass", Energy Procedia 44, (2014) 151. https://doi.org/10.1016/j.egypro.2013.12.022
- R. Sahin and I. Kabacelik, "Nanostructuring of ITO thin films through femtosecond laser ablation", Appl. Phys. A 122, (2016) 314. https://doi.org/10.1007/s00339-016-9847-7
- F. M. Ezz-Eldin, T. D. Abd-Elaziz, and N. A. Elalaily, "Effect of dilute HF solutions on chemical, optical, and mechanical properties of soda-lime-silica glass", J. Mater. Sci. 45, (2010) 5937. https://doi.org/10.1007/s10853-010-4679-x
- A. B. Burg, in "Fluorine chemistry", Vol. 1, edited by J. H. Simons (Academic Press, New York, USA, 1950) p. 180.
- D.J. Monk, D.S. Soane, and R.T. Howe, Solid-State Sensor and Actuator Workshop, "A diffusion/chemical reaction model for HF etching of LPCVD phosphosilicate glass sacrificial layers", (1992) 5th Technical Digest, IEEE Hilton Head Island, SC, USA.
- H. Zhu, M. Holl, T. Ray, S. Bhushan, and D. R Meldrum, "Characterization of deep wet etching of fused silica glass for single cell and optical sensor deposition", J. Micromech. Microeng. 19, (2009) 065013. https://doi.org/10.1088/0960-1317/19/6/065013
-
H. Nielsen and D. Hackleman, "Some Illumination on the Mechanism of
$SiO_2$ Etching in HF solutions", J. Electrochem, Soc.; Solid-State Sci. and Techno. 130, (1983) 708. - A. Mitra and J. D. Rimstidt, "Solubility and dissolution rate of silica in acid fluoride solutions", Geochimica et Cosmochimica Act 73, (2009) 7045. https://doi.org/10.1016/j.gca.2009.08.027
- C. Iliescu, "Wet etching of glass for MEMS application", Romanian J. Inform. Sci. Techno. 9 (4), (2006) 285.
- G. A. C. M. Spierings, "Wet chemical etching of silicate glasses in hydrofluoric acid based solutions", J. Mater. Sci. 28, (1993) 6261. https://doi.org/10.1007/BF01352182
-
G. A. C. M. Spierings and J. Van Dijk, "The dissolution of
$Na_2O$ -MgO-CaO-$SiO_2$ glass in aqueous HF solutions", J. Mater. Sci. 22, (1987) 1869. https://doi.org/10.1007/BF01132419 - H. S. Park, S.-H. Nam, M. H. Shin, M. K. Ju, Y.-J. Lee, J.-H Yu, J. H. Jung, S. B. Kim, S. H. Ahn, J.-H. Boo, and J. Yi, "Method for Fabricating Textured High-Haze ZnO:Al Transparent Conduction Oxide Films on Chemically Etched Glass Substrates", J. Nanosci. Nanotechno. 16, (2016) 4886. https://doi.org/10.1166/jnn.2016.12223
- K. Tsujino, S. Imai, C. -L. Lee, M. Matsumura, and S. Mizushima, "Local wet etching of glasses by acidification utilizing electrochemistry", J. Micromech. Microeng. 18, (2008) 115023. https://doi.org/10.1088/0960-1317/18/11/115023
- C. Iliescu, J. Jing, Francis E.H. Tay, J. Miao, and T. Sun, "Strategies in deep wet etching of Pyrex glass", Surf. Coat. Techno. 198, (2005) 314. https://doi.org/10.1016/j.surfcoat.2004.10.094
- A. J. Muscat, A. G. Thorsness, and G. M. Miranda, "Characterization of residues formed by anhydrous hydrogen fluoride etching of doped oxides", J. Vac. Sci. Technol. A 19 (4), (2001) 1854. https://doi.org/10.1116/1.1372907
- H. S. Park, J.-S. Jeong, M. H. Shin, S. B. Kim, and J. Yi, "Current status of light trapping in module cover glass for PV module," Current Photovolt Research 4 (3), (2016) 119. https://doi.org/10.21218/CPR.2016.4.3.119
- H. Kikuyama, M. Waki, I. Kawanabe, M. Miyashita, T. Yabune, and N. Miki, J. Takano, and T. Ohmi, "Etching Rate and Mechanism of Doped Oxide in Buffered Hydrogen Fluoride Solution", J. Electrochem. Soc. 139 (8), (1992) 2239. https://doi.org/10.1149/1.2221208
- J. Liu, N. I. Nemchuk, D. G. Ast, and J. G. Couillard, "Etch rate and surface morphology of plasma etched glass and glass-ceramic substrates", J. Non-Cryst Sol. 342, (2004) 110. https://doi.org/10.1016/j.jnoncrysol.2004.07.004
- S. J. Bong, S. H. Ahn, Le H. T. Anh, S. B. Kim, H. S. Park, C. H. Shin, J. J. Park, Y. -J. Lee, and J. Yi, "Effective Light Trapping in Thin Film Silicon Solar Cells with Nano- and Microscale Structures on Glass Substrate", J. Nanosci. Nanotechnol. 16, (2016) 4978. https://doi.org/10.1166/jnn.2016.12179