참고문헌
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- S. C. Park, K. J. Min, K. H. Lee, Y. S. Jeong, and Y. B. Park, "Effects of Temperature and Humidity Treatment Conditions on the Interfacial Adhesion Energy between the Electroless-Plated Ni and Polyimide", Jpn. J. Appl. Phys., 49(8S1), 08JK01 (2010).
- I. H. Lee, S. H. Kim, J. H. Yun, I. K. Park, and T. S. Kim, "Interfacial toughening of solution processed Ag nanoparticle thin films by organic residuals", Nanotechnology, 23(48), 485704 (2012). https://doi.org/10.1088/0957-4484/23/48/485704
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- Y. B. Park, and J. Yu, "Effects of Electroplated Cu Thickness and Polyimide Plasma Treatment Conditions on the Interfacial Fracture Mechanics Parameters in the Cu/Cr/Polyimide System", Met. Mater. Int., 7(2), 123 (2001). https://doi.org/10.1007/BF03026950
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- S. C. Park, K. J. Min, K. H. Lee, Y. S. Jeong, and Y. B. Park, "Effect of Annealing on the Interfacial Adhesion Energy between Electroless-Plated Ni and Polyimide", Met. Mater. Int., 17(1), 111 (2011). https://doi.org/10.1007/s12540-011-0215-z
- S. C. Park, J. W. Kim, K. H. Kim, S. H. Park, Y. M. Lee, and Y. B. Park, "Interfacial Adhesion between Screen-Printed Ag and Epoxy Resin-Coated Polyimide", J. Microelectron. Packag. Soc., 17(1), 41 (2010).
- B. S. Min, K. H. Seo, W. S. Chung, I. S. Lee, and S. C. Park, "Application of Plasma Cleaning for Plating Pretreatment", J. Kor. Inst. Met. & Mater., 40(8), 886 (2002).
- K. J. Min, S. C. Park, K. H. Lee, Y. S. Jeong, and Y. B. Park, "Effect of Wet Chemical Pretreatment Conditions on the Interfacial Adhesion Energy between Electroless-Plated Ni and Polyimide Films", Jpn. J. Appl. Phys., 48(8S1), 08HL03 (2010).
- J. K. Kim, K. Son, and Y. B. Park, "Interfacial Adhesion and Reliability between Epoxy Resin and Polyimide for Flexible Printed Circuit Board", J. Microelectron. Packag. Soc., 21(1), 75. (2017).
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피인용 문헌
- O2 플라즈마 전처리 및 후속 열처리 조건이 Ti 박막과 WPR 절연층 사이의 계면 접착력에 미치는 영향 vol.27, pp.1, 2020, https://doi.org/10.6117/kmeps.2020.27.1.0037