Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Mechanical Properties of High-Hardness TiNX Thin Films Deposited by Pure Nitrogen Plasma Using Magnetron Sputtering Deposition

마그네트론 스퍼터링 증착법을 사용하여 순수한 질소 플라즈마에 의해 성막된 고경도 TiNX 박막의 역학적 특성

  • Lee, Chang-Hyun (Department of Electronic & Electricity Engineering, Daegu Catholic University) ;
  • Rhee, Byung-Roh (Department of Applied Physics & Electronics, Sangji University) ;
  • Bae, Kang (Mijutech) ;
  • Park, Chang-Hwan (Department of Materials & Chemistries Engineering, Daegu Catholic University) ;
  • Kim, Hwa-Min (Department of Materials & Chemistries Engineering, Daegu Catholic University)
  • 이창현 (대구가톨릭대학교 전자전기공학과) ;
  • 이병로 (상지대학교 응용물리전자과) ;
  • 배강 ((주)미주테크) ;
  • 박창환 (대구가톨릭대학교 신소재화학공학과) ;
  • 김화민 (대구가톨릭대학교 신소재화학공학과)
  • Received : 2017.06.02
  • Accepted : 2017.06.15
  • Published : 2017.08.01
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Abstract

TiN (titanium nitride) films were prepared using the RF magnetron sputtering technique. The films were deposited by pure $N_2$ plasma sputtering. Their mechanical properties, such as nano-indentation hardness, friction coefficient, and surface wettability, have been investigated. X-ray diffraction (XRD) studies revealed that the orientation of $TiN_X$ films changed towards the (111) orientation with decreasing working pressure due to a strong compressive stress during deposition. The strongest TiN (111) orientation was found when the film was deposited at a working pressure of 1 Pa. This film showed the largest hardness (16 GPa) and smallest friction coefficient (0.17) among the studied samples. Moreover, this film was found to be accompanied by a water-repellent surface with water contact angle more than $100^{\circ}$.

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References

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