Journal of Surface Science and Engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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Development of UBMS(Unbalanced Magnetron Sputtering) System and Ion Current Density Measurement of Copper Target

UBM 마그네트론 스퍼터 시스템을 이용한 구리 타겟의 이온전류밀도 향상 연구

  • Kang, Chunghyeon (Department of Materials Science & Engineering, Kunsan National University) ;
  • Joo, Junghoon (Department of Materials Science & Engineering, Kunsan National University)
  • 강충현 (군산대학교 공과대학 신소재공학과) ;
  • 주정훈 (군산대학교 공과대학 신소재공학과)
  • Received : 2017.06.26
  • Accepted : 2017.06.28
  • Published : 2017.06.30
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Abstract

A 6-way-cross consisting of a 2.75-inch CF flange was used as a main chamber on a PFEIFFER VACUUM TMP station based on a 67 l / sec turbo molecular pump and a diaphragm pump to produce a magnet array with a volume ratio of 5.5: 1.A 1-inch diameter copper target and graphite target were fabricated using MDX-1.5K from Advanced Energy Industries, Inc as a DC power supply. Ion current density of copper target and graphite target was measured by unbalanced magnetron sputtering. The basic pressure condition was $6.3{\times}10^{-7}mbar$ and the process pressure was Ar 50 sccm at $1.0{\times}10^{-2}mbar$ (7.5 mTorr) in the Ar atmosphere. Therefore, the relative density of copper ions reaching the substrate with the measured ion current density was derived.

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References

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