전력 반도체용 갈륨 옥사이드(Ga2O3) 연구 동향

  • 지재훈 (중앙대학교 전자전기공학과) ;
  • 고중혁 (중앙대학교 전자전기공학부)
  • Published : 2017.06.01

Abstract

Keywords

References

  1. R. A. Soref and B. R. Bennett, IEEE J. Quantum Electron., 23, 123-129 (1987). https://doi.org/10.1109/JQE.1987.1073206
  2. M. N. Yoder, IEEE Trans. Power Electron., 43, 1633-1636 (1996). https://doi.org/10.1109/16.536807
  3. J. Millan, P. Godignon, X. Perpina, A. Perez-Tomas, and J. Rebollo, IEEE Trans. Power Electron., 29, 2155-2163 (2014). https://doi.org/10.1109/TPEL.2013.2268900
  4. H. Lin, CS MANTECH Conference, (Arizona, USA, 2015). 33-36.
  5. S. Dimitrijev and P. Jamet, Microelectron. Reliab., 43, 225-233 (2003). https://doi.org/10.1016/S0026-2714(02)00270-6
  6. R. F. Davis, Z. Sitar, B. E. Williams, H. S. Kong, H. J. Kim, J. W. Palmour, J. A. Edmond, J. Ryu, J. T. Glass, and C. H. Carter, Jr., Mater. Sci. Eng. B., 1, 77-104 (1988). https://doi.org/10.1016/0921-5107(88)90032-3
  7. M. Higashiwaki, K. Sasaki, A. Kuramoto, T. Masui, and S. Yamakoshi, Appl. Phys. Lett., 100, 013504 (2012). https://doi.org/10.1063/1.3674287
  8. S. Ahn, F. Ren, J. Kim, S. Oh, J. Kim, M. A. Mastro, and S. J. Pearton, Appl. Phys. Lett., 109, 062102 (2016). https://doi.org/10.1063/1.4960651
  9. M. Higashiwaki, K. Sasaki, T. Kamimura, M. H. Wong, D. Krishnamurthy, A. Kuramata, T. Masui, and S. Yamakoshi, Appl. Phys. Lett., 103, 123511 (2013). https://doi.org/10.1063/1.4821858
  10. A. Y. Cho and J. R. Arthur, Prog. Solid State Chem., 10, 157-191 (1975). https://doi.org/10.1016/0079-6786(75)90005-9
  11. M. H. Wong, K. Sasaki, A. Kuramata, S. Yamakoshi, and M. Higashiwaki, IEEE Electron Device Lett., 37, 212-215 (2016). https://doi.org/10.1109/LED.2015.2512279
  12. P. Frigeri, L. Seravalli, G. Trevisi, and S. Franchi, Semicond. Sci. Technol., 3, 480-522 (2011).
  13. T. F. Kuech, Mater. Sci. Rept., 2, 1-50 (1987). https://doi.org/10.1016/0920-2307(87)90002-8
  14. K. D. Chabak, N. Moser, A. J. Green, D. E. Walker Jr., S. E. Tetlak, E. Heller, A. Crespo, R. Fitch, J. P. McCandless, K. Leedy, M. Baldini, G. Wagner, Z. Galazka, X. Li, and G. Jessen, Appl. Phys. Lett., 109, 213501 (2016). https://doi.org/10.1063/1.4967931
  15. J. L. Zilko, K. Seshan, eds., Handbook of Thin-Film Deposition (Intel Corporation Santa Clara, California, 2001) p. 155.