Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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In Situ Heat Treatment of ZnO:Al Thin Films Fabricated by RF Magnetron Sputtering

  • Kim, Deok Kyu (Advanced LED Technology Development Project, Samsung Electronics Co. Ltd.)
  • Received : 2017.02.26
  • Accepted : 2017.03.26
  • Published : 2017.05.01
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Abstract

ZnO:Al thin films were deposited on glass substrate by RF magnetron sputtering followed by in situ heat treatment in the same chamber. Effects of in situ heat treatment on properties of ZnO:Al thin films were investigated in this study. As heat treatment temperature was increased, crystal quality was improved first and then it was deteriorated, surface roughness was decreased, and sheet resistance was also decreased. The decrease in sheet resistance was caused by increasing carrier concentration due to decreased surface roughness. The decrease in surface roughness resulted in increase of transmittance. Therefore, in situ heat treatment is an effective method for obtaining films with better electrical characteristics.

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References

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