한국염색가공학회지 (Textile Coloration and Finishing)

  • 제29권1호
  • /
  • Pages.18-24
  • /
  • 2017
  • /
  • 1229-0033(pISSN)
  • /
  • 2234-036X(eISSN)
한국염색가공학회 (The Korean Society of Dyers and Finishers)
권호 표지
DOI QR코드

DOI QR Code

RF 마그네트론 스퍼터링에 의해 실리콘이 증착된 메타아라미드 직물의 성질 분석

Properties of Silicon-deposited Meta-aramid Fabrics by RF Magnetron Sputtering

  • 박종현 (충남대학교 유기소재공학과) ;
  • 이선영 (충남대학교 유기소재공학과) ;
  • 김춘수 (충남대학교 유기소재공학과) ;
  • 강송희 (충남대학교 유기소재공학과) ;
  • 김의화 (신한대학교 섬유소재공학과) ;
  • 이승구 (충남대학교 유기소재공학과)
  • Park, Jong Hyeon (Department of Organic Materials Engineering,Chungnam National University) ;
  • Lee, Sun Young (Department of Organic Materials Engineering,Chungnam National University) ;
  • Kim, Chun Su (Department of Organic Materials Engineering,Chungnam National University) ;
  • Kang, Song Hee (Department of Organic Materials Engineering,Chungnam National University) ;
  • Kim, Eui Hwa (Department of Textile Materials Engineering, Shinhan University) ;
  • Lee, Seung Goo (Department of Organic Materials Engineering,Chungnam National University)
  • 투고 : 2017.02.12
  • 심사 : 2017.03.20
  • 발행 : 2017.03.27
PDF 다운로드
⟨ 이전 논문 다음 논문 ⟩

초록

Meta-aramid fabric has been widely used as the reinforcement of composites due to its high flame resistance and tearing strength. Functionality such as abrasion resistance of fabric is very important for specialty fabrics used in car racing suits. In this study, to improve abrasion resistance property of meta-aramid fabric, silicon deposition was conducted by utilizing RF magnetron sputtering. The sputtering process parameters effects were investigated as sputtering power and substrate temperature. The obtained results suggest that the silicon deposition on the meta-aramid fabric has obvious effect upon increasing the abrasion resistance, the thermal insulation and the electric resistance condition for silicon deposition was established. In conclusion, the results of this study have made it possible to manufacture meta-aramids with higher abrasion strength.

키워드

참고문헌

  1. N. N. Baeva, E. A. Manyukov, S. F. Sadova, L. V. Konovalova, and G. S. Negodyaeva, Sorption and Densitometric Properties of Meta/Para-aramid Fibres, Fibre Chemistry, 39(3), 205(2007). https://doi.org/10.1007/s10692-007-0041-8
  2. C. C. Foo, G. B. Chai, and L. K. Seah, Mechanical Properties of Nomex Material and Nomex Honeycomb Structure, Composite Structures, 80(4), 588(2007). https://doi.org/10.1016/j.compstruct.2006.07.010
  3. L. Yao, K. T. Kim, and J. Y. Kim, Fabrication of Metaaramid Fibrid by Precipitation, Fibers and Polymers, 13(3), 277(2012). https://doi.org/10.1007/s12221-012-0277-7
  4. I. Padleckiene, A. Abraitiene, L. Valaseviciute, S. Krauledas, R. Puodziuniene, and L. Jovaisiene, Mechanical and Thermal Properties of Meta-aramid, Viscose FR and Polyester FR Knitted Materials, Mechanika, 18(5), 174(2013).
  5. L. R. Yao and J. Y. Kim, The Microstructure and Mechanical Property of Meta-aramid Nanofiber Web for High Temperature Filter Media, In: Advanced Materials Research, Trans Tech Publications, 175(4), 318(2011).
  6. K. Ramani, W. J. Weidner, and G. Kumar, Silicon Sputtering as a Surface Treatment to Titanium Alloy for Bonding with PEKEKK, International J. of Adhesion and Adhesives, 18(6), 401(1998). https://doi.org/10.1016/S0143-7496(98)00042-6
  7. L. A. Marques, J. E. Rubio, M. Jaraiz, L. A. Bailon, and J. J. Barabolla, Dose Effects on Amorphous Silicon Sputtering by Argon Ions : A Molecular Dynamics Simulation, J. of Applied Physics, 81(3), 1488(1997). https://doi.org/10.1063/1.363914
  8. G. Xu, P. Jin, M. Tazawa, and K. Yoshimura, Optical Investigation of Silicon Nitride Thin Films Deposited by RF Magnetron Sputtering, Thin Solid Films, 425(1), 196(2003). https://doi.org/10.1016/S0040-6090(02)01089-1
  9. M. Vila, D. Caceres, and C. Prieto, Mechanical Properties of Sputtered Silicon Nitride Thin Films, J. of Applied Physics, 94(12), 7868(2003). https://doi.org/10.1063/1.1626799
  10. A. Bendjerad, S. Boukhtache, A. Benhaya, A. Lahmar, M. Zergoug, and D. Luneau, RF Magnetron Sputtering Deposition of NiO/NiBilayer and Approach of theMagnetic Behavior using the Preisach Model, J. of Magnetism and Magnetic Materials, 428, 377(2017). https://doi.org/10.1016/j.jmmm.2016.12.049
  11. Y. Ishil, T. Kaneko, K. Okimura, H. Shindo, and M. Isomura, Fabrication of Amorphous Silicon Nitride Thin Films by Radio-Frequency Sputtering Assisted by an Inductively Coupled Plasma, Thin Solid Films, 624(10), 49(2017). https://doi.org/10.1016/j.tsf.2017.01.022