참고문헌
- A. Piegary and E. Masetti, "Thin film thickness measurement: a comparison of various techniques", Thin Solid Films 124, 249-257 (1985). https://doi.org/10.1016/0040-6090(85)90273-1
- T. E. Benson, L. I. Kamlet, P. Klimecky, and F. L. Terry, JR, "In-situ spectroscopic reflectometry for polycrystalline silicon thin film etch rate determination during reactive ion etching", J. Electron. Mater. 25, 955-964 (1996). https://doi.org/10.1007/BF02666730
- T. Kihara and K. Yokomori, "Simultaneous measurement of refractive index and thickness of thin film by polarized reflectances", Appl. Opt. 29, 5069-5073 (1990). https://doi.org/10.1364/AO.29.005069
- U. Schnell and R. Dӓndliker, "Dispersive white-light interferometry for absolute distance measurement with dielectric multilayer systems on the target", Opt. Lett. 21, 528-530 (1996). https://doi.org/10.1364/OL.21.000528
- D. Kim, S. Kim, H. J. Kong, Y. Lee, and Y. K. Kwak, "Fast thickness profile measurement using a peak detection method based on an acousto-optic tunable filter", Meas. Sci. Technol. 13 (2002) L1. https://doi.org/10.1088/0957-0233/13/7/101
- J.-W. You, S. Kim, and D. Kim, "High speed volumetric thickness profile measurement based on full-field wavelength scanning interferometer", Opt. Express 16, 21022-21031 (2008). https://doi.org/10.1364/OE.16.021022
- Y.-M. Hwang, S.-W. Yoon, J.-H. Kim, S. Kim, and H.-J. Pahk, "Thin-film thickness profile measurement using wavelet transform in wavelength-scanning interferometry", Opt. Laser. Eng. 46, 179-184 (2008). https://doi.org/10.1016/j.optlaseng.2007.07.005
- M. Urbanek, J. Spousta, T. Behounek, and T. Sikola, "Imaging reflectometry in situ", Appl. Opt. 46, 6309-6313 (2007).
- M. Ohlidal, I. Ohlidal, P. Klapetek, D. Necas, and A. Majumdar, "Measurement of the thickness distribution and optical constants of non-uniform thin films", Meas. Sci. Technol. 22 (2011) 085104. https://doi.org/10.1088/0957-0233/22/8/085104
- K. Kim, S. Kim, S. Kwon, and H. J. Pahk, "Volumetric thin film thickness measurement using spectroscopic imaging reflectometer and compensation of reflectance modeling error", Int. J. Precis. Eng. Man. 15(9), 1817-1822 (2014). https://doi.org/10.1007/s12541-014-0534-3
- S. Kwon, N. Y. Kim, T. Jo, and H. J. Pahk, "Critical dimension measurement of transparent film layers by multispectral imaging", Opt. Express 22, 17370-17381 (2014). https://doi.org/10.1364/OE.22.017370
- H. Fujiwara, Spectroscopic Ellipsometry: Principles and Applications, p. 43 (Wiley, New York, USA, 2007)