Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Fabrication of High Refractive Index ZrO2 Thin Film by a Layer-by-layer Self-assembly Method

LBL-SA법을 이용한 고굴절률 ZrO2 박막 제조

  • Choi, Chang-Sik (Optic & Display Materials Center, Korea Institute of Ceramic Engineering and Technology) ;
  • Lee, Ji-Sun (Optic & Display Materials Center, Korea Institute of Ceramic Engineering and Technology) ;
  • Lee, Mi-Jai (Optic & Display Materials Center, Korea Institute of Ceramic Engineering and Technology) ;
  • Lee, Young-Jin (Optic & Display Materials Center, Korea Institute of Ceramic Engineering and Technology) ;
  • Jeon, Dae-Woo (Optic & Display Materials Center, Korea Institute of Ceramic Engineering and Technology) ;
  • Ahn, Byoung-Jo (HanKyung TEC Co., Ltd.) ;
  • Kim, Jin-Ho (Optic & Display Materials Center, Korea Institute of Ceramic Engineering and Technology)
  • 최창식 (한국세라믹기술원 광.디스플레이 소재센터) ;
  • 이지선 (한국세라믹기술원 광.디스플레이 소재센터) ;
  • 이미재 (한국세라믹기술원 광.디스플레이 소재센터) ;
  • 이영진 (한국세라믹기술원 광.디스플레이 소재센터) ;
  • 전대우 (한국세라믹기술원 광.디스플레이 소재센터) ;
  • 안병조 (한경 TEC 주식회사) ;
  • 김진호 (한국세라믹기술원 광.디스플레이 소재센터)
  • Received : 2016.10.04
  • Accepted : 2017.02.09
  • Published : 2017.04.01
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Abstract

$ZrO_2/PSS$ thin film with a high refractive index was fabricated on a glass substrate by a layer-by-layer self-assembly method. The surface morphology and thickness of the fabricated $ZrO_2/PSS$ thin films were measured as a function of the number of $(ZrO_2/PSS)n$. As the number of $(ZrO_2/PSS)n$ increased from n = 5 to n = 20, RMS roughness decreased from 29.01 nm to 8.368 nm. The $ZrO_2$ thin films exhibited high transmittance of 85% or more; and the 15-bilayer thin film exhibited the highest transmittance among the samples. The transmittance of the fabricated $(ZrO_2/PSS)_{15}$ thin film was ca. 90.8% in the visible range. The refractive index of the glass substrate coated by a $(ZrO_2/PSS)_{15}$ thin film with a thickness of 160 nm increased from ca. 1.52 to 1.74 at the 632 nm wavelength.

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References

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