Journal of the Semiconductor & Display Technology (반도체디스플레이기술학회지)

The Korean Society Of Semiconductor & Display Technology (한국반도체디스플레이기술학회)
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Improved Self Plasma-Optical Emission Spectroscopy for In-situ Plasma Process Monitoring

실시간 플라즈마공정 모니터링을 위한 Self Plasma-Optical Emission Spectroscopy 성능 향상

  • Jo, Kyung Jae (Department of Electronic Engineering, Myongji University) ;
  • Hong, Sang Jeen (Department of Electronic Engineering, Myongji University)
  • Received : 2017.06.16
  • Accepted : 2017.06.26
  • Published : 2017.06.30
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Abstract

We reports improved monitoring performance of Self plasma-optical emission spectroscopy (SP-OES) by augmenting a by-pass tube to a conventional straight (or single) tube type self plasma reactor. SP-OES has been used as a tool for the monitoring of plasma chemistry indirectly in plasma process system. The benefits of SP-OES are low cost and easy installation, but some semiconductor industries who adopted commercialized SP-OES product experiencing less sensitivity and slow sensor response. OH out-gas chemistry monitoring was performed to have a direct comparison of a conventional single type tube and a by-pass type tube, and fluid dynamic simulation on the improved hardware design was also followed. It is observed faster pumping out of OH from the chamber in the by-pass type SP-OES.

Keywords

References

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