Applied Science and Convergence Technology

한국진공학회 (The Korean Vacuum Society)
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Effective Control of CH4/H2 Plasma Condition to Synthesize Graphene Nano-walls with Controlled Morphology and Structural Quality

  • Park, Hyun Jae (Plasma Technology Research Center, National Fusion Research Institute (NFRI)) ;
  • Shin, Jin-ha (Plasma Technology Research Center, National Fusion Research Institute (NFRI)) ;
  • Lee, Kang-il (Plasma Technology Research Center, National Fusion Research Institute (NFRI)) ;
  • Choi, Yong Sup (Plasma Technology Research Center, National Fusion Research Institute (NFRI)) ;
  • Song, Young Il (Advanced Materials Science and Engineering, Advanced Materials and Process Research Center(AMPRC) Sungkyunkwan University) ;
  • Suh, Su Jeong (Advanced Materials Science and Engineering, Advanced Materials and Process Research Center(AMPRC) Sungkyunkwan University) ;
  • Jung, Yong Ho (Plasma Technology Research Center, National Fusion Research Institute (NFRI))
  • 투고 : 2017.09.21
  • 심사 : 2017.10.30
  • 발행 : 2017.11.30
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초록

The direct growth method is simplified manufacturing process used to avoid damages and contaminants from the graphene transfer process. In this paper, graphene nano-walls (GNWs) were direct synthesized using electron cyclotron resonance (ECR) plasma by varying the $CH_4/H_2$ gas flow rate on the copper foil at low temperature (without substrate heater). Investigations were carried out of the changes in the morphology and characteristic of GNWs due to the relative intensity of hydrocarbon radical and molecule in the ECR plasma. The results of these investigations were then discussed.

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