References
-
C. Y. Ma, W. J. Wang, C. Y. Miao, S. L. Li, and Q. Y. Zhang, "Structural, Morphological, Optical and Photoluminescence Properties of
$HfO_2$ Thin Films," Thin Solid Films, 545 279-84 (2013). https://doi.org/10.1016/j.tsf.2013.08.068 - M. Alcisi, S. Scaglione, S. Martelli, A. Rizzo, and L. Vasanelli, "Structural and Optical Modification in Hafnium Oxide Thin Films Related to the Momentum Parameter Transferred by Ion Beam Assistance," Thin Solid Films, 354 19-23 (1999). https://doi.org/10.1016/S0040-6090(99)00534-9
-
M. Fadel, O. A. Azim M., O. A. Omer, and R. R. Basily, "A Study of Some Optical Properties of Hafnium Dioxide (
$HfO_2$ ) Thin Films and Their Applications," Appl. Phys. A, 66 [3] 335-43 (1998). https://doi.org/10.1007/s003390050675 - F. L. Martinez, M. Toledano-Luque, J. J. Gandia, J. Carabe, W. Bohne, J. Rohrich, E. Strub, and I. Martil, "Optical Properties and Structure of HfO2 Thin Films Grown by High Pressure Reactive Sputtering", J. Phys. D: Appl. Phys., 40 [17] 5256-65 (2007). https://doi.org/10.1088/0022-3727/40/17/037
- K. Kamala Bharathi, N. R. Kalidindi, and C. V. Ramana, "Grain Size and Strain Effects on the Optical and Electrical Properties of Hafnium Oxide Nanocrystalline Thin Films," J. Appl. Phys., 108 [8] 083529-1-5 (2010). https://doi.org/10.1063/1.3499325
- J. M. Khoshman, A. Khan, and M. E. Kordesch, "Amorphous Hafnium Oxide Thin Films for Antireflection Optical Coatings," Surf. Coat. Technol., 202 [11] 2500-2 (2008). https://doi.org/10.1016/j.surfcoat.2007.07.095
-
G. Dai, Y. Chen, J. Lu, Z. Shen, and X. Ni, "Analysis of Laser Induced Thermal Mechanical Relationship of
$HfO_2/SiO_2$ High Reflective Optical Thin Film at 1064 nm," Chin. Opt. Lett., 7 [7] 601-4 (2009). https://doi.org/10.3788/COL20090707.0601 -
W. Liu, Z. Liu, F. Yan, T. Tan, and H. Tian, "Influence of
$O_2/Ar$ Flow Ratio on the Structure and Optical Properties of Sputtered Hafnium Dioxide Thin Films," Surf. Coat. Technol., 205 [7] 2120-25 (2010). https://doi.org/10.1016/j.surfcoat.2010.08.116 - M. F. Al-Kuhaili, "Optical Properties of Hafnium Oxide Thin Films and Their Application in Energy-Efficient Windows," Opt. Mater., 27 [3] 383-87 (2004). https://doi.org/10.1016/j.optmat.2004.04.014
-
J. Ni, Q. Zhou, Z. Li, and Z. Zhang, "Oxygen Defect Induced Photoluminescence of
$HfO_2$ Thin Films," Appl. Phys. Lett., 93 [1] 011905-1-3 (2008). https://doi.org/10.1063/1.2952288 -
R. Puthenkovilakam, Y.-S. Lin, J. Choi, J. Lu, H.-O. Blom, P. Pianetta, D. Devine, M. Sendler, and J. P. Chang, "Effects of Post-Deposition Annealing on the Material Characteristics of Ultrathin
$HfO_2$ Films on Silicon," J. Appl. Phys., 97 [2] 023704-1-7 (2005). https://doi.org/10.1063/1.1831543 - J. W. Park, D. K. Lee, D. Lim, H. Lee, and S. H. Choi, "Optical Properties of Thermally Annealed Hafnium Oxide and Their Correlation with Structural Change," J. Appl. Phys., 104 [3] 033521-1-5 (2008). https://doi.org/10.1063/1.2961326
-
C. T. Kuo, R. Kwor, and K. M. Jones, "Study of Sputtered
$HfO_2$ Thin Films on Silicon," Thin Solid Films, 213 257-64 (1992). https://doi.org/10.1016/0040-6090(92)90291-I -
T. Tan, Z. Liu, H. Lu, W. Liu, and H. Tian, "Structure and Optical Properties of
$HfO_2$ Thin Films on Silicon after Rapid Thermal Annealing," Opt. Mater., 32 [3] 432-35 (2010). https://doi.org/10.1016/j.optmat.2009.10.003 -
M. Modreanu, J. Sancho-Parramon, D. O'Connell, J. Justice, O. Durand, and B. Servet, "Solid Phase Crystallisation of
$HfO_2$ Thin Films," Mater. Sci. Eng. B, 118 [1-3] 127-31 (2005). https://doi.org/10.1016/j.mseb.2004.12.068 -
H. Gruger, C. Kunath, E. Kurth, S. Sorge, W. Pufe, and T. Pechstein, "High Quality r.f. Sputtered Metal Oxides (
$Ta_2O_5$ ,$HfO_2$ ) and their Properties after Annealing," Thin Solid Films, 447 509-15 (2004). - W. L. Bragg and A. B. Pippard, "The Form Birefringence of Macromolecules," Acta. Cryst., 6 [11-12] 865-67 (1953). https://doi.org/10.1107/S0365110X53002519
- S. Ben Amor, B. Rogier, G. Baud, M. Jacquet, and M. Nardin, "Characterization of Zirconia Films Deposited by r.f. Magnetron Sputtering," Mater. Sci. Eng. B, 57 [1] 28-39 (1998). https://doi.org/10.1016/S0921-5107(98)00205-0
Cited by
- /Si(100) by laser molecular beam epitaxy vol.5, pp.9, 2018, https://doi.org/10.1088/2053-1591/aad5ce
- Physical property improvement of IZTO thin films using a hafnia buffer layer vol.124, pp.1, 2018, https://doi.org/10.1007/s00339-017-1500-6
- Effects of Working Pressure on Structural and Optical Properties of HfO2 Thin Films vol.12, pp.6, 2016, https://doi.org/10.13067/jkiecs.2017.12.6.1019