Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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Study on Electron Temperature Diagnostic and the ITO Thin Film Characteristics of the Plasma Emission Intensity by the Oxygen Gas Flow

산소 유량별 플라즈마 방출광원 세기에 따른 전자온도 진단과 산화주석박막 특성연구

  • Park, Hye Jin (Department of Electrical and Biological Physics, Kwangwoon University) ;
  • Choi, Jin-Woo (Department of Electrical and Biological Physics, Kwangwoon University) ;
  • Jo, Tae Hoon (Department of Electrical and Biological Physics, Kwangwoon University) ;
  • Yun, Myoung Soo (Department of Electrical and Biological Physics, Kwangwoon University) ;
  • Kwon, Gi-Chung (Department of Electrical and Biological Physics, Kwangwoon University)
  • 박혜진 (광운대학교 전자바이오물리학과) ;
  • 최진우 (광운대학교 전자바이오물리학과) ;
  • 조태훈 (광운대학교 전자바이오물리학과) ;
  • 윤명수 (광운대학교 전자바이오물리학과) ;
  • 권기청 (광운대학교 전자바이오물리학과)
  • Received : 2016.02.15
  • Accepted : 2016.02.29
  • Published : 2016.02.29
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Abstract

The plasma has been used in various industrial fields of semiconductors, displays, transparent electrode and so on. Plasma diagnostics is critical to the uniform process and the product. We use the electron temperature of the various plasma parameters for the diagnosis of plasma. Generally, the range of the electron temperature which is used in a semiconductor process used the range of 1 eV to 10 eV. The difference of electron temperature of 0.5 eV has a influence in plasma process. The electron temperature can be measured by the electrical method and the optical method. Measurement of electron temperature for various gas flow rates was performed in DC-magnetron sputter and Inductively Coupled Plasma. The physical properties of the thin film were also determined by changing electron temperatures. The transmittance was measured using the integrating sphere, and wavelength range was measured at 300 ~ 1100 nm. We obtain the thin film of the mobility, resistivity and carrier concentration using the hall measurement system. As to the electron temperature increase, optical and electrical properties decrease. We determine it was influenced by the oxygen flow ratio and plasma.

Keywords

References

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