The Transactions of The Korean Institute of Electrical Engineers (전기학회논문지)

The Korean Institute of Electrical Engineers (대한전기학회)
권호 표지
DOI QR코드

DOI QR Code

Analysis of the Gain Characteristic in LLCC Resonant Converter for Plasma Power Supply

플라즈마 전원장치용 LLCC 공진컨버터의 이득 특성 분석

  • Kwon, Min-Jun (Dept. of Electrical Electronic & Control Engineering, Hankyong National University) ;
  • Kim, Tae-Hun (Dept. of Electrical Electronic & Control Engineering, Hankyong National University) ;
  • Lee, Woo-Cheol (Dept. of Electrical Electronic & Control Engineering, Institute for information technology convergence, Hankyong National University)
  • Received : 2016.08.23
  • Accepted : 2016.11.11
  • Published : 2016.12.01
Download PDF
⟨ Previous Next ⟩

Abstract

The plasma process is applied to various industrial fields such as high-tech IT industry, textiles and medical. Therefore, there is increasing interest in the plasma power supply, and demand for power devices of high efficiency and high power density is increased. Plasma power supply for process must solve the arc problem, when the plasma is unstable. The output capacitor is closely related to the arc problem. If the output capacitor is smaller, the damage from the arc problem is reduced. However, the small value of the output capacitor affects the operating characteristics of the power supply. In this paper, a LLC resonant converter is adopted, because it can achieve high efficiency and power density in the plasma DC power supply. However, due to the small value of the output capacitor, the converter is operated as a LLCC resonant converter. Therefore, a gain characteristic of LLCC resonant converter is analyzed by using the FHA (First Harmonic Approximation) in plasma power supply. Simulation and experimental results are presented to verify the characteristic analysis of LLCC Resonant Converter.

Keywords

References

  1. B. Yang, F. C. Lee, A. J. Zhabg, and G. Huang, "LLC Resonant Converter for Front End DC/DC Conversion," in Proc. IEEE APEC'02, pp. 1108-1112, 2002.
  2. C. Corbella, "Plasma Parameters of Pulsed-dc discharges in methane used to deposit diamondlike carbon films," Journal of Applied Physics, Vol. 106, 03302, 2009.
  3. Noborn Kuriyama, Yutaka Yatsu "POWER SUPPLY UNIT FOR SPUTTERING DEVICE" U. S. Patent 6,416,638 B1, Jul, 9, 2002.
  4. J. H. Ban, H. M. Hee, and J. S. Kim, "A Study on Energy Recovery Circuit in Sputtering Plasma Power supply for arc Discharge Prevention," The transaction of the korean institute of electrical engineers p. 61(3), pp. 116-121, 2012. https://doi.org/10.5370/KIEEP.2012.61.3.116
  5. J. H. Kim, "Analysis and Design for LLC Resonant Converter Considering Output Capacitance of MOSFET", Master's Thesis, KAIST, 2011.
  6. B. H. Lee, M. Y. Kim, C. E. Kim, K. B. Park and G. W. Moon, "Analysis of LLC Resonant Converter Considering Effect of Parasitic Components" in Proc. INTELEC'09, pp. 1-6, Oct. 2009.
  7. H. K. Lee, E. S. Kim, D. Y. Huh, G. S. Lee, B. G. Chung, and S. I. Kang, "Operating Characteristics of LLC Series Resonant Converter Using a LLT Transformer." The Transactions of the Korea Institute of Power Electronics. vol. 11, no. 5, pp. 409-416, 2006.
  8. J. Sellers, "Asymmetric bipolar pulsed DC: Theenabling technology for reactive PVD," Surface and Coatings Technology. vol. 98, no. 1, pp. 1245-1250(6), January 1998. https://doi.org/10.1016/S0257-8972(97)00403-9