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Numerical Modeling of Floating Electrodes in a Plasma Processing System

  • Joo, Junghoon (Graduate Program of Plasma Convergence Engineering & Plasma Materials Research Center, Kunsan National University)
  • Received : 2015.07.29
  • Accepted : 2015.07.30
  • Published : 2015.07.30

Abstract

Fluid model based numerical analysis is done to simulate a plasma processing system with electrodes at floating potential. $V_f$ is a function of electron temperature, electron mass and ion mass. Commercial plasma fluid simulation softwares do not provide options for floating electrode boundary value condition. We developed a user subroutine in CFD-ACE+ and compared four different cases: grounded, dielectric, zero normal electric field and floating electric potential for a 2D-CCP (capacitively coupled plasma) with a ring electrode.

Keywords

References

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Cited by

  1. Analysis of contaminated QMS, cleaning and restoration of functions vol.48, pp.4, 2015, https://doi.org/10.5695/JKISE.2015.48.4.179