DOI QR코드

DOI QR Code

Effects of PCB Surface Finishes on in-situ Intermetallics Growth and Electromigration Characteristics of Sn-3.0Ag-0.5Cu Pb-free Solder Joints

PCB 표면처리에 따른 Sn-3.0Ag-0.5Cu 무연솔더 접합부의 in-situ 금속간 화합물 성장 및 Electromigration 특성 분석

  • Kim, Sung-Hyuk (School of Materials Science and Engineering, Andong National University) ;
  • Park, Gyu-Tae (School of Materials Science and Engineering, Andong National University) ;
  • Lee, Byeong-Rok (School of Materials Science and Engineering, Andong National University) ;
  • Kim, Jae-Myeong (STATS ChipPAC Korea Ltd.) ;
  • Yoo, Sehoon (Korea Institute of Industrial Technology, Advanced Welding and Joining R&BD Group) ;
  • Park, Young-Bae (School of Materials Science and Engineering, Andong National University)
  • 김성혁 (안동대학교 신소재공학부 청정에너지소재기술연구센터) ;
  • 박규태 (안동대학교 신소재공학부 청정에너지소재기술연구센터) ;
  • 이병록 (안동대학교 신소재공학부 청정에너지소재기술연구센터) ;
  • 김재명 (스태츠칩팩코리아 기술연구소) ;
  • 유세훈 (한국생산기술연구원 용접접합연구실용화그룹) ;
  • 박영배 (안동대학교 신소재공학부 청정에너지소재기술연구센터)
  • Received : 2015.05.29
  • Accepted : 2015.06.29
  • Published : 2015.06.30

Abstract

The effects of electroless nickel immersion gold (ENIG) and organic solderability preservative (OSP) surface finishes on the in-situ intermetallics reaction and the electromigration (EM) reliability of Sn-3.0Ag-0.5Cu (SAC305) solder bump were systematically investigated. After as-bonded, $(Cu,Ni)_6Sn_5$ intermetallic compound (IMC) was formed at the interface of the ENIG surface finish at solder top side, while at the OSP surface finish at solder bottom side,$ Cu_6Sn_5$ and $Cu_3Sn$ IMCs were formed. Mean time to failure on SAC305 solder bump at $130^{\circ}C$ with a current density of $5.0{\times}10^3A/cm^2$ was 78.7 hrs. EM open failure was observed at bottom OSP surface finish by fast consumption of Cu atoms when electrons flow from bottom Cu substrate to solder. In-situ scanning electron microscope analysis showed that IMC growth rate of ENIG surface finish was much lower than that of the OSP surface finish. Therefore, EM reliability of ENIG surface finish was higher than that of OSP surface finish due to its superior barrier stability to IMC reaction.

인쇄회로기판 솔더 상부 및 하부 접합부의 서로 다른 표면처리 조건에 따른 Sn-3.0Ag-0.5Cu (SAC305) 접합부의 열처리 및 전류 인가에 따른 금속간 화합물 성장거동을 비교하기 위하여 in-situ 미세구조분석 및 electromigration (EM) 수명평가를 실시하였다. 솔더 접합 직후, 상부 접합부의 electroless nickel immersion gold (ENIG) 표면처리에서는 $(Cu,Ni)_6Sn_5$, 하부 접합부의 organic solderability preservative (OSP) 표면처리에서는$ Cu_6Sn_5$, $Cu_3Sn$ 금속간 화합물이 접합 계면에서 생성되었다. EM 수명평가 결과 온도 $130^{\circ}C$, 전류밀도 $5.0{\times}10^3A/cm^2$ 하에서 평균파괴시간이 약 78.7 hrs으로 도출되었고, 하부 OSP 표면처리에서 전자가 솔더로 빠져나가는 부분에서 Cu의 소모에 의한 단락이 주 손상기구로 확인되었다. In-situ 주사전자현미경을 통해 계면 미세구조 분석 결과 상부 접합부 ENIG 표면처리에서 전자의 방향에 따른 미세구조의 큰 차이가 없고 뚜렷한 손상이 관찰되지 않았으나, 하부 접합부 OSP 표면처리의 경우 전자가 솔더로 유입되는 부분에서 빠른 Cu 소모로 인한 보이드 성장이 관찰되었다. 따라서, SAC305무연솔더 접합부에서 ENIG 표면처리가 OSP 표면처리보다 보다 우수한 EM확산방지막 역할을 하여 금속간 화합물 성장을 억제하고 보다 우수한 EM 신뢰성을 보이는 것으로 판단된다.

Keywords

References

  1. S. Y. Oh, "Electronic Packaging Technology Roadmap", J. Microelectron. Packag. Soc., pp. 5-80 (2009).
  2. K. S. Kim, Y. C. Lee, J. H. Ahn, J. Y. Song, C. D. Yoo and S. B. Jung, "Effect of Process Parameters on TSV Formation Using Deep Reactive Ion Etching(in Kor.)", J. Kor. Inst. Met.& Mater., 48(11), 1028 (2010). https://doi.org/10.3365/KJMM.2010.48.11.1028
  3. J. H. Lee, N. H. Kang, C. W. Lee and J. H. Kim, "Necessity of Low Melting Temperature Pb-free Solder Alloy and Characteristics of Representative Alloys", Int. J. of KWS, 24(2), 17 (2006).
  4. Directive 2002/95/EC of the European Parliament and of the Council, Restriction of the Use of Certain Hazardous Substances in Electrical and Electronic Equipment (RoHS), EU (2003).
  5. Y. E. Shin and S. J Hwang, "Characterization of the Sn-Ag-Cu and Sn-Cu Lead-free Solder by adding P(in Kor.)", J. KIEEME, 16(6), 549 (2003).
  6. D. Suh, D. W. Kim, P. Liu, H. Kim, J. A. Weninger, C. M. Kumar, A. Prasad, B. W. Grimsley and H. B. Tejada, "Effects of Ag Content on Fracture Resistance of Sn-Ag-Cu Lead-Free Solders under High-Strain Rate Conditions", Mater. Sci. Eng. A., 460-461, 595 (2007). https://doi.org/10.1016/j.msea.2007.01.145
  7. M. McCormack and S. Jin, "Progress in the Design of New Lead-Free Solder Alloys", JOM., 45(7), 36 (1993).
  8. J. M. Koo, C. Y. Lee and S. B. Jung, "Effect of Reflow Number on Mechanical and Electrical Properties of Ball Grid Array (BGA) Solder Joints(in Kor.)", J. Microelectron. Packag. Soc., 14(4), 71 (2007).
  9. V. Denis and C. Gilles, "OSP Coatings: The Nitrogen Solution", Proc. 18th Electronic Manufacturing Technology Symposium, Japan, IEEE/CMPT International, p. 101 (1995).
  10. D. Chang, F. Bai, Y. P. Wang and C. S. Hsiao, "The Study of OSP as Reliable Surface Finish of BGA Substrate", Proc. 6th Electronics Packaging Technology Conference (EPTC), 149, Singapore, IEEE (2004).
  11. H. K. Lee, S. H. Son, H. Y. Lee and J. M. Jeon, "A Study on the ENIG Surface Finish Process and its Properties(in Kor.)", J. Kor. Inst. Surf. Eng., 40(1), 32 (2007). https://doi.org/10.5695/JKISE.2007.40.1.032
  12. M. Ding, G Wang, B. Chao, P. S. Ho, P. Su and T. Uehling, "Effect of contact metallization on electromigration reliability of Pb-free solder joints", J. Appl. Phys., 99(9), 094906 (2006). https://doi.org/10.1063/1.2193037
  13. S. H. Kim, B. R. Lee, J. M. Kim, S. H. Yoo and Y. B. Park, "Effects of PCB ENIG and OSP Surface Finishes on the Electromigration Reliability and Shear Strength of Sn-3.5Ag PBFree Solder Bump(in Kor.)", Kor. J. Mater. Res., 24(3), 166 (2014). https://doi.org/10.3740/MRSK.2014.24.3.166
  14. S. H. Kim, J. H. Kim, S. H. Yoo and Y. B. Park, "Effects of surface finishes and current stressing on the interfacial reaction characteristics of Sn-1.2Ag-0.7Cu-0.4In solder bumps", Curr. Appl. Phys., 13(2), S103 (2013). https://doi.org/10.1016/j.cap.2013.01.002
  15. C. E. Ho, R. Y. Tsai, Y. L. Lin and C. R. Kao, "Effect of Cu concentration on the reactions between Sn-Ag-Cu solders and Ni", J. Electron. Mater., 31(6), 584 (2002). https://doi.org/10.1007/s11664-002-0129-0
  16. M. H. Jeong, J. W. Kim, B. H. Kwak, B. J. Kim, K. W. Lee, J. D. Kim, Y. C. Joo, and Y. B. Park, "Intermetallic Compound Growth Characteristics of Cu/thin Sn/Cu Bump for 3-D Stacked IC Package", Kor. J. Met. Mater., 49(2), 180 (2010). https://doi.org/10.3365/KJMM.2011.49.2.180
  17. G. T. Lim, B. J. Kim, K. W. Lee, J. D. Kim, Y. C. Joo and Y. B. Park, "Temperature Effect on Intermetallic Compound Growth Kinetics of Cu Pillar/Sn Bumps", J. Electron. Mater., 38(11), 2228 (2009). https://doi.org/10.1007/s11664-009-0922-0
  18. J. M. Kim, M. H. Jeong, S. H. Yoo and Y. B. Park, "Effects of Surface Finishes and Current Stressing on Interfacial Reaction Characteristics of Sn-3.0Ag-0.5Cu Solder Bumps", J. Electron. Mater., 41(4), 791 (2012). https://doi.org/10.1007/s11664-011-1888-2
  19. H. Gan and K. N. Tu, "Polarity Effect of Electromigration on Kinetics of Intermetallic Compound Formation in Pb-Free Solder V-Groove Samples", J. Appl. Phys., 97(6), 063514 (2005). https://doi.org/10.1063/1.1861151

Cited by

  1. Growth Behavior of Intermetallic Compounds in Various Solder Joints Induced by Electromigration vol.39, pp.1, 2015, https://doi.org/10.5781/jwj.2021.39.1.11