Journal of the Korean Crystal Growth and Crystal Technology (한국결정성장학회지)

The Korea Association of Crystal Growth (한국결정성장학회)
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A study on SiC crystal growth by sublimation process using resistance heating method

저항가열 방식을 적용한 승화법에 의한 SiC 결정 성장에 대한 연구

  • Kang, Seung Min (Department of Advanced Materials Science and Engineering, Hanseo University)
  • Received : 2015.06.01
  • Accepted : 2015.06.12
  • Published : 2015.06.30
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Abstract

SiC crystals are well known for their true potential as high power devices and their crystal growth activity is actively carried out in domestic as well as in abroad. Until now the process to grow this crystal has been done by sublimation technique using radio frequency induction heating method. However in order to get better quality of SiC crystals, the stability of temperature is needed because SiC crystal tends to transform to other polytypes. So, the possibility of SiC crytals growth was evaluated by different heating method. This study aimed to observe whether the resistant heating method would show stable growth and better quality of SiC single crystal than that of RF induction heating. As a result, polycrystalline SiC crystals were grown by the growth rate of 0.02~0.5 mm/hr under the condition of $2100{\sim}2300^{\circ}C$ at the bottom side of the crucible and 10~760 torr. The polycrystalline SiC crystals with 0.25 and 0.5 mm in thickness were grown successfully without seed and characterized by optical stereo microscopic observation.

SiC 결정은 전력반도체 소자용 소재로서 지금까지 외국은 물론 국내에서도 많은 연구가 이루어지고 있으며, 지금까지 고주파 유도가열 방식을 이용한 승화법으로 성장되어 왔다. 그러나, SiC 단결정은 결정 성장 계면에서의 온도 안정성에 따라 쉽게 다른 다형으로 성장하기 때문에, 고품질의 결정을 얻기 위해서는 결정성장 계면에서의 안정적인 온도 구배가 필요하다. 본 논문에서는 저항가열 방식을 이용한 승화법 성장 장치를 이용하여 종자결정을 사용하지 않은 상태에서 SIC 다결정상을 성장하여 보고, 성장 양상에 대하여 고찰하고자 하였다. SiC 다결정상은 성장속도 0.02~0.5 mm/hr로 성장되었으며, 성장된 SiC 다결정상의 두께는 0.25 mm~0.5 mm이고, 이 때 도가니 하부의 온도는 $2100{\sim}2300^{\circ}C$, 성장 압력은 10~760 torr의 범위에서 조절되었다. 성장된 다결정상 결정은 광학현미경으로 관찰하여, 성장 거동을 고찰하였다.

Keywords

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