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The Korean Vacuum Society (한국진공학회)
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Technology for the Multi-layer Nanoimprint Lithography Equipments and Nanoscale Measurement

다층 나노임프린트 리소그래피 시스템 및 나노측정기술

  • 이재종 (한국기계연구원 나노융합기계연구본부, 과학기술연합대학원 대학교(UST) 나노메카트로닉스과) ;
  • 최기봉 (한국기계연구원 나노융합기계연구본부) ;
  • 김기홍 (한국기계연구원 나노융합기계연구본부) ;
  • 임형준 (한국기계연구원 나노융합기계연구본부)
  • Published : 2015.03.30
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Abstract

With the recognition of nanotechnology as one of the future strategic technologies, the R&D efforts have been performed under exclusive supports of governments and private sectors. At present, nanotechnology is at the focus of research and public attention in almost every advanced country including USA, Japan, and many others in EU. Keeping tracks of such technical trends, center for nanoscale mechatronics and manufacturing (CNMM) was established in 2002 as a part of national nanotechnology promotion policy led by ministry of science and technology (MOST) in Korea. It will hold widespread potential applications in electronics, optical electronics, biotechnology, micro systems, etc, with the promises of commercial visibility and competitiveness. In this paper, wafer scale multilayer nanoimprint lithography technology which is well-known the next generation lithography, roll-typed nanoimprint lithography (R-NIL), roll-typed liquid transfer imprint lithography (R-LTIL), the key technology for nanomanufacturing and nanoscale measurement technology will be introduced. Additionally, its applications and some achievements such as solar cell, biosensor, hard disk drive, and MOSFET, etc by means of the developed multilayer nanoimprint lithography system are introduced.

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References

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