Applied Science and Convergence Technology

The Korean Vacuum Society (한국진공학회)
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Initial growth mode of ultra-thin Al films on a W(110) surface at high temperatures

  • Choi, Dae Sun (Department of Physics, Kangwon National University) ;
  • Park, Mi Mi (Department of Physics, Kangwon National University)
  • Received : 2015.11.09
  • Accepted : 2015.11.20
  • Published : 2015.11.30
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Abstract

We investigated the adsorption structures and the initial growth mode of ultra-thin Al films on a W(110) surface at a high temperature. When Al atoms were adsorbed on the W(110) at the substrate temperature of 1100 K and with coverage of 0.5ML, Al atoms formed a p($2{\times}1$) double-domain structure. When the coverage was 1.0 ML, the double domain of a hexagonal structure (fcc(111) face) rotated ${\pm}5^{\circ}$ from the [100] direction of the W(110) surface and another distorted hexagonal structure were found. Low-energy electron diffraction results along with ion scattering spectroscopy results showed that the Al atoms followed the Volmer-Weber growth mode at a high temperature.

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References

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