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The Korean Vacuum Society (한국진공학회)
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Thin Film Vacuum Process Technology via Chemical Vapor Deposition Methods

화학기상증착법(CVD)을 이용한 진공 박막 공정기술

  • 홍완식 (서울시립대학교 나노과학기술학과)
  • Published : 2014.09.30
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Abstract

Vacuum growth of thin films via chemical vapor deposition (CVD) methods has been extensively used in modern semiconductor and flat panel display industries. The CVD processes have a wide range of variation and are categorized according to their working conditions, power sources, precursor materials, and so forth. Basic components and process steps common to all CVD branches are discussed. In addition, characteristics and applications of two major CVD techniques - LPCVD and PECVD - are reviewed briefly.

Keywords

References

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