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A Comparative Study of CrN Coatings Deposited by DC and Asymmetric Bipolar Pulsed DC Sputtering

DC 스퍼터법과 비대칭 바이폴라 펄스 DC 스퍼터법으로 제작된 CrN 코팅막의 물성 비교연구

  • Chun, Sung-Yong (Department of Advanced Materials Science and Engineering, Mokpo National University) ;
  • Baek, Ji-Won (Department of Advanced Materials Science and Engineering, Mokpo National University)
  • 전성용 (목포대학교 신소재공학과) ;
  • 백지원 (목포대학교 신소재공학과)
  • Received : 2014.03.04
  • Accepted : 2014.04.10
  • Published : 2014.04.30

Abstract

The purpose of this comparative study was to investigate the properties of chromium nitride coatings deposited by asymmetric bipolar pulsed DC sputtering and DC sputtering system. Oscilloscope traces of the I-V waveforms indicate high power and high current density outputs during the asymmetric bipolar pulsed mode. The grain size decreases with decreasing duty cycle. The duty cycle has a strong influence not only on the microstructural properties but also on the mechanical properties of chromium nitride coatings. Comparing with the continuous DC sputtering, the chromium nitride coatings prepared by pulsed DC asymmetric bipolar process also exhibit better surface roughness.

Keywords

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