Journal of the Korean Institute of Gas (한국가스학회지)

The Korean Institute of GAS (한국가스학회)
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A Study on the Estimation of Damage by Leaking of NH3 and Cl2 applied to LPCVD

LPCVD에서 암모니아와 염소의 누출에 대한 피해예측

  • Huh, Yong-Jeong (Gas Appliances Division, Korea Gas Safety Corporation) ;
  • Leem, Sa-Hwan (School of Mechatronics, Korea University of Technology and Education)
  • 허용정 (한국가스안전공사 시험검사처) ;
  • 임사환 (한국기술교육대학교 메카트로닉스공학과)
  • Received : 2014.01.08
  • Accepted : 2014.08.16
  • Published : 2014.10.31
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Abstract

As high-tech science has developed, the need of semiconductor is required constantly. However, there are many processes which use a great deal of poisonous gas in the semiconductor process, so the dangerousness by a gas leak is latent in these processes. Especially, the accident of toxic gas is almost made by ammonia and chlorine. Therefore this report estimates the damage by the leak of ammonia and chlorine used in LPCVD system.

첨단과학이 발전하면서 반도체의 필요성은 끊임없이 요구되고 있으며, 이러한 반도체 공정에서는 다량의 독성가스를 이용한 공정이 많다. 이러한 공정에서 가스의 누설로 인한 사고의 위험성은 항상 내재되어 있는 실정이다. 특히 국내 독성가스 사고는 암모니아와 염소에 의한 사고가 대부분이다. 따라서 본 논문에서는 LPCVD 공정에서 사용하는 암모니아와 염소의 누출로 인한 피해를 예측하여 안전에 만전을 기하고자 한다.

Keywords

References

  1. Doo-Young Yang, "LPCVD", The Korea Ceramic Society, 3(2), 60-68, (2000)
  2. Woo-Seok Cheong, "Optimization of Selective Epitaxial Growth of Silicon in LPCVD", ETRI Journal, 25(6), 503-509, (2003) https://doi.org/10.4218/etrij.03.0103.0003
  3. M. Ivanda, U. V. Desnica, C. W. White and W. Kiefer, "Experimental Observation of Optical Amplification in Silicon Nanocrystals, NATO Science Series 93, Towards the First Silicon Laser, Edited by L. Pavesi, S. Gaponenko, and L. Dal Negro, Kluwer Academic Publ., Dordrecht, 191-197, (2003)
  4. M. Ivanda. Implementation and Development of the LPCVD Process. grant no. TP-01/0098-23.
  5. Korea Gas Safety Corporation, 2006 gas accident yearbook, Sunjin printing, (2007)
  6. Finney, D. J., Probit Analysis, Cambridge, (1947)
  7. Korea gas Safety Corporation, High Pressure Gas Safety Control Law. Hwasinmunhwa, 16, (2011)
  8. http://www.mathesontrigas.com/MSDS
  9. American Conference of Governmental Industrial Hygienists(ACGIH), Documentation of the Threshold Limit Values and Biological Exposure Indies, Cincinnati, OH, (1996)
  10. Carl L. Yaws, Matheson Gas Data Book I : Deventh Edition, Matheson Tri-Gas, (2001)
  11. Carl L. Yaws, Matheson Gas Data Book II : Deventh Edition, Matheson Tri-Gas, (2001)
  12. Goldfrank LR, Flomenbaum NE, Lewin NA, et al, eds. Goldfrank's Toxicologic Emergencies. 8th ed. New York, NY: McGraw Hill, (2006)
  13. Ford M, Delaney KA, Ling L, Erickson T, eds. Clinical Toxicology. 1st ed. Philadelphia, Pa: Saunders Elsevier, (2001)
  14. http://en.wikipedia.org/wiki/Ammonia
  15. Winder, Chris. "The Toxicology of Chlorine". Environmental Research 85(2), 105-114, (2001) https://doi.org/10.1006/enrs.2000.4110
  16. http://en.wikipedia.org/wiki/Chlorine
  17. CCPS, Guideline for Chemical Process Quantitive Risk Analysis, 2nd Edition AIChE, New York, (2000)
  18. Crowl, D. A. And J. F. louvar, Chemical Process Safety : Fundamentals with Applications, 2nd Edition Prentice-Hall, New Jersey, (2002)

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  1. Awareness of Toxicity Induced by Chlorine vol.23, pp.2, 2018, https://doi.org/10.5812/traumamon.62862