Journal of the Optical Society of Korea

  • 제17권5호
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  • Pages.392-398
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  • 2013
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  • 1226-4776(pISSN)
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  • 2093-6885(eISSN)
한국광학회 (Optical Society of Korea)
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In-line Critical Dimension Measurement System Development of LCD Pattern Proposed by Newly Developed Edge Detection Algorithm

  • Park, Sung-Hoon (School of Mechanical and Aerospace Engineering, Seoul National University) ;
  • Lee, Jeong-Ho (Optical Equipment Group, Samsung Electro-Mechanics) ;
  • Pahk, Heui-Jae (School of Mechanical and Aerospace Engineering, Seoul National University)
  • 투고 : 2013.06.20
  • 심사 : 2013.08.27
  • 발행 : 2013.10.25
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초록

As the essential techniques for the CD (Critical Dimension) measurement of the LCD pattern, there are various modules such as an optics design, auto-focus [1-4], and precise edge detection. Since the operation of image enhancement to improve the CD measurement repeatability, a ring type of the reflected lighting optics is devised. It has a simpler structure than the transmission light optics, but it delivers the same output. The edge detection is the most essential function of the CD measurements. The CD measurement is a vital inspection for LCDs [5-6] and semiconductors [7-8] to improve the production yield rate, there are numbers of techniques to measure the CD. So in this study, a new subpixel algorithm is developed through facet modeling, which complements the previous sub-pixel edge detection algorithm. Currently this CD measurement system is being used in LCD manufacturing systems for repeatability of less than 30 nm.

키워드

참고문헌

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피인용 문헌

  1. Critical dimension measurement of transparent film layers by multispectral imaging vol.22, pp.14, 2014, https://doi.org/10.1364/OE.22.017370
  2. Methods to Measure the Critical Dimension of the Bottoms of Through-Silicon Vias Using White-Light Scanning Interferometry vol.18, pp.5, 2014, https://doi.org/10.3807/JOSK.2014.18.5.531