참고문헌
- Y. H. Han, K. T. Kim, N. C. Ahn, H. J. Shin, I. H. Choi, and S. Moon, "Fabrication and characterization of bolometeric oxide thin films based on vanadium tungsten alloy", Sens. Actuator A-Phys., Vol. 123-124, pp. 660-664, 2005. https://doi.org/10.1016/j.sna.2005.01.024
- T. Ichihara, T. Watabe, Y. Handa, and K. Aizawa, "A high performance amorphous Si1-xCx: H thermistor bolometer based on micro-machined structure", International Conference on Solid State Sensors and Actuators Papers, Vol. 2, pp. 1253-1256 , 1997.
- N. C. Anh and S. Moon, "Excess noise in vanadium tungsten oxide bolometric material", Infrared Phys. Technol., Vol. 50, pp. 38-41, 2007. https://doi.org/10.1016/j.infrared.2006.06.032
-
J. H. Kim, G. H. Kyo, C. J. Lee, S. H. Hahm, Y. C. Jung, and Y. S. Lee, "The surface morphology and electrical properties of NiO with various RF power and
$O_2$ /(Ar+$O_2$ ) gas mixture", Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices, Japan, 2012. - Y. M. Lu, W. S. Hwang, W. Y. Liu, and J. S. Yang, "Effect of RF power on optical and electrical properties of ZnO thin film by magnetron sputtering", Mater. Chem. Phys., Vol. 72, pp. 269-272, 2001. https://doi.org/10.1016/S0254-0584(01)00450-3
- K. J. Patel, M. S. Desai, C. J. Panchal, and B. Rehani, "p-type transparent NiO thin films by e-beam evaporation techniques", J. Nano-Electron. Phys., Vol. 3, pp. 376-382, 2011.
- D. Hwang, K. Bang, M. Jeong, and J. Myoung, "Effects of RF power variation on properties of ZnO thin films and electrical properties of p-n homojunction", J. Cryst. Growth, Vol. 254, pp. 449- 455, 2003. https://doi.org/10.1016/S0022-0248(03)01205-3
- H. L. Chen, Y. M. Lu, and W. S. Hwang, "Effect of film thickness on structural and electrical properties of sputter-deposited nickel oxide films", Mater. Trans., Vol. 46, No. 4, pp. 872-879, 2005. https://doi.org/10.2320/matertrans.46.872
- H. L. Chen and Y. S. Yang, "Effect of crystallographic orientations on electrical properties of sputter-deposited nickel oxide thin films", Thin Solid Films, Vol. 516, pp. 5590-5596, 2008. https://doi.org/10.1016/j.tsf.2007.07.035
- O. Kohmoto, H. Makagawa, F. Ono, and A. Chayahara, "Effect of heat treatment on the oxygen content and resistivity in sputtered NiO films", J. Magn. Magn. Mater., Vol. 226-230, pp. 1627-1630, 2001. https://doi.org/10.1016/S0304-8853(00)01042-8
- H. L. Chen, Y. M. Lu, and W. S. Hwang, "Characterization of sputtered NiO thin films", Surf. Coat. Technol., Vol. 198, pp. 138-142, 2005. https://doi.org/10.1016/j.surfcoat.2004.10.032
- T. Kamins, Polycrystalline Silicon for Integrated Circuit Applications, Kluwer Academy Publishers, Boston, 1998.
- S. Sedky, P. Fiorini, M. Caymax, A. Verbist, and C. Baert, "IR bolometers made of polycrystalline silicon germanium", Sens. Actuator A-Phys., Vol. 66, pp. 193-199, 1998. https://doi.org/10.1016/S0924-4247(98)00007-7
- D. S. Kim, S. M. Park, and H. C. Lee, "Surface treatment method for 1/f noise suppression in reactively sputtered nickel oxide film", J. Appl. Phys., Vol. 112, pp. 24501-24504, 2012. https://doi.org/10.1063/1.4736590
피인용 문헌
- Studies on Magnetron-Sputtered NiO/Si3N4 Thin Films 2017, https://doi.org/10.1142/S0219581X17600390