빔 쉐이핑된 펨토초 레이저를 이용한 터치스크린 패널의 ITO 박막 패터닝

Patterning of ITO on Touch Screen Panels using a beam shaped femtosecond laser

  • 김명주 (한국기계연구원 나노공정연구실) ;
  • 김용현 (한국기계연구원 광응용기계연구실) ;
  • 윤지욱 (한국기계연구원 나노공정연구실) ;
  • 최원석 (한국기계연구원 나노공정연구실) ;
  • 조성학 (한국기계연구원 나노공정연구실) ;
  • 최지연 (한국기계연구원 광응용기계연구실)
  • Kim, Myung-Ju (Nano Machining Laboratory, KIMM (Korea Institute of Machinery and Materials)) ;
  • Kim, Yong-Hyun (Dept. of laser and ebeam application, KIMM (Korea Institute of Machinery and Materials)) ;
  • Yoon, Ji-Wook (Nano Machining Laboratory, KIMM (Korea Institute of Machinery and Materials)) ;
  • Choi, Won-Seok (Nano Machining Laboratory, KIMM (Korea Institute of Machinery and Materials)) ;
  • Cho, Sung-Hak (Nano Machining Laboratory, KIMM (Korea Institute of Machinery and Materials)) ;
  • Choi, Jiyeon (Dept. of laser and ebeam application, KIMM (Korea Institute of Machinery and Materials))
  • 투고 : 2013.11.19
  • 심사 : 2013.12.26
  • 발행 : 2013.12.31

초록

Femtosecond laser patterning of ITO on a touch screen panel with a shaped fs laser beam was investigated. A quasi flat-top beam was formed using a variable mask and a planoconvex lens. The spatial profile of the original Gaussian beam and the shaped beam were monitored by a CCD beam profiler. The laser patterned ITO film was examined using an optical microscope, Scanning Electron Microscope (SEM) with Energy Dispersive X-ray Spectroscopy (EDS), and Atomic Force Microscope (AFM). It turned out that the quality of the ITO pattern fabricated by a shaped beam is superior to that of the pattern without beam shaping in terms of debris generation, height of the craters, and homogeneity of the bottom. Optimum processing window was determined at the laser irradiance exhibiting 100% removal of Sn. The removal rate of In was measured to be 83%.

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