References
- Vincent Pott, Geng Li Chua, Ramesh Vaddi, Julius Ming-Lin Tsai and Tony T.Kim, "The Shuttle Nanoelectormechanical Nonvolatile Memory," IEEE Trasactions on electron devices No.4, Vol.59, April.2012, pp. 1137-1143.
- Kousuke Miyaji, Chingling Hung and Ken Takuechi, "Scaling Trends and Tradeoffs between Short Channel Effect and Channel Boosting Characteristics in Sub-20 nm Bulk/Silicon-on- Insulator NAND Flash," Japanese Journal of Applied Physics, Vol.51, April.2012, pp. 04DD12- 1-7 https://doi.org/10.1143/JJAP.51.04DD12
- Kwangseok Lee and Woo Young Choi, "Nanoelectromechanical Memory Cell (T Cell) for Low-Cost Embedded Nonvolatile Memory Applications," IEEE Trasactions on Electron Devices No.4, Vol.58, April.2011, pp. 1264-1267
- W. Y. Choi, H. Kam, D. Lee, J. Lai, and T.-J. King Liu:"Compact Nano-Electro-Mechanical Non- Volatile Memory (NEMory) for 3D Integration," IEDM Tech.Dig.,2007,p.603.
- Carolina Nunes Kirchner, Karl Heinz Hallmeier, Rudiger Szargan, Thomas Raschke, Christian Radehaus, Gunther Wittstock, "Evaluation of Thin Film Titanium Nitride Electrodes for Electroanalytical Applications," Electroanalysis, vol. 19, No.10, 2007, pp.1023-1031. https://doi.org/10.1002/elan.200703832
- Yongqing Fu, Hejun Du, Weimin Huang, Sam Zhang, Min Hu,"TiNi-based thin filmsin MEMS applications: a review," Sensors and Actuators A , Vol. 112, 2004, pp.395-408. https://doi.org/10.1016/j.sna.2004.02.019
- Woo Young Choi, Taro Osabe and Tsu-Jae Kimng, "Nano-Electro-Mechanical Nonvolatile Memory (NEMory) Cell Design and Scaling," IEEE Trasactions on Electron Devices No.12, Vol.55, Dec.2008, pp. 3482-3488.
- Alison Wood and Stefan Detterbeck, "Etching Silicon Nitride and Silicon Oxide Using Ethylene Glycol/Hydrofluoric Acid Mixtures," Electrochemical Society Proceedings, Vol. 99-36, 1999, pp.258-259.
- Ken K. Ho and Gregory P. Carman, "Sputter deposition of NiTi thin film shape memory alloy using a heated target," Solid-State Circuits, Thin Solid Films, vol. 370, Issue 1-2, Jul. 2000, pp.18-29. https://doi.org/10.1016/S0040-6090(00)00947-0
- C.L. Chu, S.K. Wu and Y.C. Yen, "Oxidation behavior of equiatomic TiNi alloy in high temperature air environment," Materials Science and Engineering: A, vol. 216, No. 1, Oct. 1996, pp.193-200. https://doi.org/10.1016/0921-5093(96)10409-3
- A. Ohta, S. Bhansali, I. Kishimoto, and A. Umeda, "Novel fabrication technique of TiNi shape memory alloy film using separate Ti and Ni targets," Sensors and Actuators A, vol. 86, Issue 3, Nov. 2000, pp.165-170. https://doi.org/10.1016/S0924-4247(00)00449-0