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피인용 문헌
- Novel Ni silicide formed with a Ni/Er/Ni/TiN structure for thermal stable and low contact resistance source/drain in MOSFETs vol.53, pp.8S3, 2014, https://doi.org/10.7567/JJAP.53.08NE05
- A Study on Contact Resistance Reduction in Ni Germanide/Ge using Sb Interlayer vol.16, pp.2, 2016, https://doi.org/10.5573/JSTS.2016.16.2.210
- Study of SiO2 on Ni and Ti Silicide After Different Oxidation Techniques Investigated by XRR, SEM and Ellipsometry pp.1573-4889, 2019, https://doi.org/10.1007/s11085-019-09885-2