Journal of the Optical Society of Korea

  • 제16권3호
  • /
  • Pages.221-227
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  • 2012
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  • 1226-4776(pISSN)
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  • 2093-6885(eISSN)
한국광학회 (Optical Society of Korea)
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Optical Proximity Corrections for Digital Micromirror Device-based Maskless Lithography

  • Hur, Jungyu (Department of Mechanical System Engineering, Graduate School, Tongmyoung University) ;
  • Seo, Manseung (Department of Robot System Engineering, Tongmyong University)
  • 투고 : 2012.08.08
  • 심사 : 2012.08.24
  • 발행 : 2012.09.25
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초록

We propose optical proximity corrections (OPCs) for digital micromirror device (DMD)-based maskless lithography. A pattern writing scheme is analyzed and a theoretical model for obtaining the dose distribution profile and resulting structure is derived. By using simulation based on this model we were able to reduce the edge placement error (EPE) between the design width and the critical dimension (CD) of a fabricated photoresist, which enables improvement of the CD. Moreover, by experiments carried out with the parameter derived from the writing scheme, we minimized the corner-rounding effect by controlling light transmission to the corners of a feature by modulating a DMD.

키워드

참고문헌

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피인용 문헌

  1. Detecting Digital Micromirror Device Malfunctions in High-throughput Maskless Lithography vol.17, pp.6, 2013, https://doi.org/10.3807/JOSK.2013.17.6.513
  2. In-line Critical Dimension Measurement System Development of LCD Pattern Proposed by Newly Developed Edge Detection Algorithm vol.17, pp.5, 2013, https://doi.org/10.3807/JOSK.2013.17.5.392
  3. Experimental Study of Numerical Optimization for 3-D Microstructuring Using DMD-Based Grayscale Lithography vol.24, pp.6, 2015, https://doi.org/10.1109/JMEMS.2015.2447548
  4. 3D nano/microfabrication techniques and nanobiomaterials for neural tissue regeneration vol.9, pp.6, 2014, https://doi.org/10.2217/nnm.14.36
  5. Simulation of the effect of incline incident angle in DMD Maskless Lithography vol.844, 2017, https://doi.org/10.1088/1742-6596/844/1/012031
  6. Reduction of buried microstructure diffraction in fabricating curved microstructure by multiple exposure method vol.26, pp.24, 2018, https://doi.org/10.1364/OE.26.031085