Journal of Korean Institute of Industrial Engineers (대한산업공학회지)

Korean Institute of Industrial Engineers (대한산업공학회)
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Estimating the Reliability of Virtual Metrology Predictions in Semiconductor Manufacturing : A Novelty Detection-based Approach

이상치 탐지 방법론을 활용한 반도체 가상 계측 결과의 신뢰도 추정

  • Kang, Pil-Sung (IT Management Programme, International Fusion School, Seoul National University of Science and Technology(Seoultech)) ;
  • Kim, Dong-Il (Industrial Engineering, Seoul National University) ;
  • Lee, Seung-Kyung (Industrial Engineering, Seoul National University) ;
  • Doh, Seung-Yong (Samsung SDS) ;
  • Cho, Sung-Zoon (Industrial Engineering, Seoul National University)
  • 강필성 (서울과학기술대학교 국제융합학부 IT Management) ;
  • 김동일 (서울대학교 산업공학과) ;
  • 이승경 (서울대학교 산업공학과) ;
  • 도승용 (삼성 SDS) ;
  • 조성준 (서울대학교 산업공학과)
  • Received : 2011.09.21
  • Accepted : 2012.02.14
  • Published : 2012.03.01
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Abstract

The purpose of virtual metrology (VM) in semiconductor manufacturing is to predict every wafer's metrological values based on its process equipment data without an actual metrology. In this paper, we propose novelty detection-based reliability estimation models for VM in order to support flexible utilization of VM results. Because the proposed model can not only estimate the reliability of VM, but also identify suspicious process variables lowering the reliability, quality control actions can be taken selectively based on the reliance level and its causes. Based on the preliminary experimental results with actual semiconductor manufacturing process data, our models can successfully give a high reliance level to the wafers with small prediction errors and a low reliance level to the wafers with large prediction errors. In addition, our proposed model can give more detailed information by identifying the critical process variables and their relative impacts on the low reliability.

Keywords

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