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COMPUTATIONAL ASSESSEMENT OF OPTIMAL FLOW RATE FOR STABLE FLOW IN A VERTICAL ROTATING DISk CHEMICAL VAPOR DEPOSITION REACTOR

회전식 화학증착 장치 내부의 유동해석을 통한 최적 유량 평가

  • Kwak, H.S. (Dept. of Mechanical System Engineering, Kumoh Nat'l Institute of Technology)
  • 곽호상 (금오공과대학교 기계시스템공학과)
  • Received : 2011.12.28
  • Accepted : 2012.03.12
  • Published : 2012.03.31

Abstract

A numerical investigation is conducted to search for the optimal flow rate for a rotating-disk chemical vapor decomposition reactor operating at a high temperature and a low pressure. The flow of a gas mixture supplied into the reactor is modeled by a laminar flow of an ideal gas obeying the kinetic theory. The axisymmetric two-dimensional flow in the reactor is simulated by employing a CFD package FLUENT. With operating pressure and temperature fixed, numerical computations are performed by varying rotation rate and flow rate. Examination of the structures of flow and thermal fields leads to a flow regime diagram illustrating that there are a stable plug-like flow regime and a few unfavorable flow regimes induced by mass unbalance or buoyancy. The criterion for sustaining a plug-like flow regime is discussed based on a theoretical scaling argument. Interpretation of the flow regime map suggests that a favorable flow is attainable with a minimum flow rate at the smallest rotation rate guaranteeing the dominance of rotation effects over buoyancy.

Keywords

References

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