전기학회논문지 (The Transactions of The Korean Institute of Electrical Engineers)

  • 제61권1호
  • /
  • Pages.94-98
  • /
  • 2012
  • /
  • 1975-8359(pISSN)
  • /
  • 2287-4364(eISSN)
대한전기학회 (The Korean Institute of Electrical Engineers)
권호 표지
DOI QR코드

DOI QR Code

신개념 태양전지 세정용 오존마이크로 버블에 관한 연구

A Study on Ozone Micro Bubble Effects for Solar Cell Wafer Cleaning

  • 투고 : 2011.10.23
  • 심사 : 2011.12.26
  • 발행 : 2012.01.01
PDF 다운로드
⟨ 이전 논문 다음 논문 ⟩

초록

The behavior of ozone micro bubble cleaning system was investigated to evaluate the solution as a new method of solar cell wafer cleaning in comparison with former conventional RCA cleaning. We have developed the ozone dissolution system in the ozonated water for more efficient cleaning conditions. The optimized cleaning conditions for solar cell wafer process were 10 ppm of ozone concentration and 12 minutes in cleaning periods, respectively. We have confirmed the cleaning reliability and cell efficiencies after ozone micro bubble cleaning. Using this new cleaning technology, it was possible to obtain higher efficiency, higher productivity, and fast tact time for applying cleaning in the fields on bare ingot wafer, LED wafers as well as the solar cell wafer.

키워드

참고문헌

  1. W. Kern, Handbook of Semiconductor Wafer Cleaning Technology, Noyes Publication, pp. 383-391, 1993.
  2. J Wei and S. Verhaverbeke, Cleaning Technology in Semiconductor Device Manufacturing, The Electrochemical Society, pp. 496-504, 1998.
  3. 윤종국, 김영균, 최현철, 구경완, "오존마이크로버블을 이용한 태양 전지 웨이퍼의 세정" 2011년도 대한전기학회 전기설비부문 춘계학술대회, pp. 74-77, 2011.
  4. S Nelson, "Ozonated Water for Wafer Cleaning and Photoresist Removal" Solid State Technology July pp. 107-112, 1999.
  5. Rice Aharan Netzer, Handbook of Ozone Technology Vol. II, Ann Arbor Scence Book, 1984.
  6. Bruno Langlais David A, Ozone in water treatment : Application and Engineering, American Water Works Association Research Foundation, 1991.
  7. 이건호, 김인정, 배소익 "실리콘 웨이퍼 세정을 위한 오존의 거동에 관한 연구" 반도체디스플레이장비학회지 제4권 4호, 2005.
  8. 최상태, 전병준, "실리콘웨이퍼 세정공정의 오존/UV 효과" 정보전자기술논총 제3권 , pp. 205-214, 2003.
  9. Y. Shiramizu, K. Watanabe, M, Tanaka, H. Aoki, and H. Kitajima, J. Electrochemistry Society, pp. 143, 1996.
  10. De Smedt, F. DeGendt, S. Heyns, and Vickier,C. "The Application of Ozone in Semiconductor Cleaning Process: The Solubility Issue", Electrochemistry Society, pp. 487-493, 2001.
  11. 최현철, "상압 플라즈마 장치의 유입구 유량이 접촉각에 미치는 영향에 관한 연구", 한국기술교육대학교 메카트로닉스 석사논문, pp. 37-41 2009.
  12. 김경희, 강병하, 이대영 "접촉각이 유하액막 특성에 미치는 영향에 관한 실험적 고찰" 한국설비공학논문집 제8권 11호 pp. 867-873, 2006.