Korean Journal of Metals and Materials (대한금속재료학회지)

The Korean Institute of Metals and Materials (대한금속재료학회)
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Fabrication and Evaluation of Al Targets using the SPS Technique and their Sputter Fabricated Films

방전플라즈마 소결법에 의해 제조된 Al 타겟과 스퍼터링 박막의 특성평가

  • Hyun, Hye Young (Measurement & Analysis Team, National Nanofab Center, Applied Materials Science and Engineering Division, Hanbat National University) ;
  • Kim, Min Jung (Measurement & Analysis Team, National Nanofab Center) ;
  • Yoo, Jung Ho (Measurement & Analysis Team, National Nanofab Center) ;
  • Jeong, Chil Seong (Measurement & Analysis Team, National Nanofab Center) ;
  • Yang, Jun-Mo (Measurement & Analysis Team, National Nanofab Center) ;
  • Oh, Ik Hyun (Korea Institute of Industrial Technology) ;
  • Park, Hyun-Kuk (Korea Institute of Industrial Technology) ;
  • Lee, Seung Min (Korea Institute of Industrial Technology) ;
  • Oh, Yong Jun (Applied Materials Science and Engineering Division, Hanbat National University)
  • 현혜영 (나노종합팹센터 특성평가팀, 한밭대학교응용소재학과) ;
  • 김민정 (나노종합팹센터 특성평가팀) ;
  • 유정호 (나노종합팹센터 특성평가팀) ;
  • 정칠성 (나노종합팹센터 특성평가팀) ;
  • 양준모 (나노종합팹센터 특성평가팀) ;
  • 오익현 (한국생산기술연구원) ;
  • 박현국 (한국생산기술연구원) ;
  • 이승민 (한국생산기술연구원) ;
  • 오용준 (한밭대학교 응용소재학과)
  • Received : 2010.11.17
  • Published : 2011.06.25
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Abstract

The basic properties and electrical characteristics of sputtering films deposited with a commercial cast target and spark plasma sintering (SPS) were compared and analyzed. The results, revealed that, the Al film prepared by heating at $60^{\circ}C/min$ (SPS process) showed a specific resistance similar to the commercial cast Al film. In addition, the results of XRD, SIMS and TEM, showed that there was not much difference in the crystal structure and impurities between the two films. Consequently, the SPS Al target was found to have properties quite similar to the commercial one and it is expected to be applied in future research to the metal wiring material for semiconductor/display devices.

Keywords

Acknowledgement

Grant : 산업원천기술개발사업

Supported by : 지식경제부

References

  1. G. Bertrand, S. Deleonibus, B. Previtali, G. Guegan, X. Jehl, M. Sanquer, and F. Balestra, Solid-State Electron 48, 505 (2004). https://doi.org/10.1016/j.sse.2003.09.026
  2. M. Tokita, Proc. NEDO Int. Symp. on Funct. Graded Mater. p. 23 (1999).
  3. O. Yanagisawa, H. Kuramoto, K. Matsugi, and T. Hatayama, Proc. NEDO Int. Symp. on Funct. Graded Mater. p. 127 (1999).
  4. H. Y. Hyun, M. J. Kim, J. H. Yoo, M. S. Hyun, J. -M. Yang, I. H. Oh, S. M. Lee, and Y. J. Oh, Kor. J. Met. Mater. 49, 250 (2011). https://doi.org/10.3365/KJMM.2011.49.3.250
  5. D. William, Materials Science and Engineering, 6th Edition, p. 649 (2004).
  6. K. H. Kim, J.-M. Yang, C. W. Ahn, H. S. Seo, I. S. Kang, and W. J. Hwang, J. Kor. Inst. Met. & Mater. 46, 458 (2008).
  7. S. Kalpakjian, Manufacturing Engineering and Technology, 4th Edition (1989).