Bulletin of the Korean Chemical Society

Korean Chemical Society (대한화학회)
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Cathodic Stripping Voltammetry of Tellurium(IV) at a Bismuth Film Electrode

  • Myung, No-Seung (Department of Applied Chemistry, Konkuk University) ;
  • Ham, Sun-Young (Department of Applied Chemistry, Konkuk University) ;
  • Choi, Seung-Un (Department of Applied Chemistry, Konkuk University) ;
  • Chae, Yu-Jin (Department of Applied Chemistry, Konkuk University) ;
  • Lee, Woo-Ju (Department of Applied Chemistry, Konkuk University) ;
  • Kwak, Ji-Hye (Department of Applied Chemistry, Konkuk University) ;
  • Rajeshwar, Krishnan (Center for Renewable Energy Science & Technology (CREST), The University of Texas at Arlington)
  • Received : 2011.06.10
  • Accepted : 2011.07.25
  • Published : 2011.09.20
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References

  1. Wang, J. Stripping Analysis; VCH Publishers: Deerfield Beach, 1985.
  2. Rajeshwar, K.; Ibanez, J. Environmental Electrochemistry; Academic Press: San Diego, 1997.
  3. Wang, J.; Lu, J.; Hocevar, S.; Farias, P.; Ogorevc, B. Anal. Chem. 2000, 72, 3218. https://doi.org/10.1021/ac000108x
  4. Wang, J. Electroanalysis 2005, 17, 1341. https://doi.org/10.1002/elan.200403270
  5. Hocevar, S. B.; Ogorevc, B.; Wang, J.; Pihlar, B. Electroanalysis 2002, 14, 1707. https://doi.org/10.1002/elan.200290014
  6. Economou, A. Trends Anal. Chem. 2005, 24, 334. https://doi.org/10.1016/j.trac.2004.11.006
  7. Jiang, L.; Wang, Y.; Ding, J.; Lou, T.; Qin, W. Electrochem. Commun. 2010, 12, 202. https://doi.org/10.1016/j.elecom.2009.11.024
  8. Wang, J.; Lu, J. Electrochem. Commun. 2000, 2, 390. https://doi.org/10.1016/S1388-2481(00)00045-X
  9. Chatzitheodorou, E.; Economou, A.; Voulgaropoulos, A. Electroanalysis 2004, 16, 1745. https://doi.org/10.1002/elan.200403051
  10. Morfobos, M.; Economou, A.; Voulgaropoulos, A. Anal. Chim. Acta 2004, 519, 57. https://doi.org/10.1016/j.aca.2004.05.022
  11. Sparks, R. D.; Chambers, J. Q.; Xue, Z. L. Anal. Chim. Acta 2009, 643, 19. https://doi.org/10.1016/j.aca.2009.03.052
  12. Hocevar, S. B.; Wang, J.; Deo, R. P.; Ogorevc, B. Electroanalysis 2002, 14, 112. https://doi.org/10.1002/1521-4109(200201)14:2<112::AID-ELAN112>3.0.CO;2-5
  13. Hutton, E. A.; Ogorevc, B.; Hocevar, S. B.; Weldon, F.; Smyth, M. R.; Wang, J. Electrochem. Commun. 2001, 3, 707. https://doi.org/10.1016/S1388-2481(01)00240-5
  14. Guzsvany, V.; Kadar, M.; Gaal, F.; Bjelica, L.; Toth, K. Electroanalysis 2006, 18, 1363. https://doi.org/10.1002/elan.200603540
  15. Zong, P.; Nagaosa, Y. Microchim. Acta 2009, 166, 139. https://doi.org/10.1007/s00604-009-0176-9
  16. Zong, P.; Nagaosa, Y. Anal. Lett. 2009, 42, 1997. https://doi.org/10.1080/00032710903082770
  17. Jiajie, L.; Nagaosa, Y. Anal. Chim. Acta 2007, 593, 1. https://doi.org/10.1016/j.aca.2007.04.052
  18. Jiajie, L.; Nagaosa, Y. Anal. Sci. 2007, 23, 1343. https://doi.org/10.2116/analsci.23.1343
  19. Wadia, C.; Alivisatos, A. P.; Kammen, D. Environ. Sci. Technol. 2009, 43, 2072. https://doi.org/10.1021/es8019534
  20. Ham, S.; Jeon, S.; Lee, U.; Park, M.; Paeng, K. J.; Myung, N.; Rajeshwar, K. Anal. Chem. 2008, 80, 6724. https://doi.org/10.1021/ac8008127
  21. Yang, H. Y.; Sun, I. W. Electroanalysis 1999, 11, 195. https://doi.org/10.1002/(SICI)1521-4109(199903)11:3<195::AID-ELAN195>3.0.CO;2-C
  22. Myung, N.; Wei, C.; Rajeshwar, K. Anal. Chem. 1992, 64, 2701. https://doi.org/10.1021/ac00046a009
  23. Sapp, S. A.; Lakshmi, B. B.; Martin, C. R. Adv. Mater. 1999, 11, 402. https://doi.org/10.1002/(SICI)1521-4095(199903)11:5<402::AID-ADMA402>3.0.CO;2-L
  24. M.-Gonz lez, M. S.; Prieto, A. L.; Gronsky, R.; Sands, T.; Stacy, A. M. J. Electrochem. Soc. 2002, 149, C546.
  25. Ham, S.; Choi, B.; Paeng, K. J.; Myung, N.; Rajeshwar, K. Electrochem. Commun. 2007, 9, 1293. https://doi.org/10.1016/j.elecom.2007.01.037