Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Determination of Thin Film Thickness by EDS Analysis and its Modeling

EDS 분석과 모델링에 의한 박막두께 측정 방법에 관한 연구

  • Yun, Jae-Jin (Department of Materials Science and Engineering, KAIST) ;
  • Lee, Won-Jong (Department of Materials Science and Engineering, KAIST)
  • 윤재진 (한국과학기술원 신소재공학과) ;
  • 이원종 (한국과학기술원 신소재공학과)
  • Received : 2011.06.28
  • Accepted : 2011.07.24
  • Published : 2011.08.01
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Abstract

In this study, a method to measure the thickness of thin film by EDS (energy dispersive spectroscopy) is suggested. We have developed a model which calculates the thickness of thin film from the characteristic x-ray intensity ratio of the elements in thin film and substrate by considering incident electron beam energy, x-ray generation curve, backscattering and absorption of x-ray, take-off angle of x-ray and tilt angle of the sample. We obtained the relation curve between the film thickness measured experimentally and the x-ray intensity ratio of elements. The film thicknesses calculated from the model agrees quite well with those measured experimentally. Therefore, the thin film thickness can be measured rapidly and accurately by using the model developed in this study and the x-ray intensity ratio obtained in EDS analysis.

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References

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