Journal of Korea Multimedia Society (한국멀티미디어학회논문지)

Korea Multimedia Society (한국멀티미디어학회)
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Wafer Position Recognition System Using Radial Shape Calibrator

방사형 캘리브레이터률 이용한 웨이퍼 위치 인식시스템

  • 이병국 (동서대학교 컴퓨터정보공학부) ;
  • 이준재 (계명대학교 게임모바일콘텐츠학과)
  • Received : 2011.02.07
  • Accepted : 2011.04.13
  • Published : 2011.05.31
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Abstract

This paper presents a position error recognition system when the wafer is mounted in cleaning equipment among the wafer manufacturing processes. The proposed system is to enhance the performance in cost and reliability by preventing the wafer cleaning system from damaging by alerting it when it is put in correct position. The proposed algorithm is in obtaining a mapping function from camera and physical wafer by designing and manufacturing the radial shape calibrator to reduce the error by using the conventional chess board one. The system is to install in-line process using high reliable and high accurate position recognition. The experimental results show that the performance of the proposed system is better than that of the existing method for detecting errors within tolerance.

본 논문에서는 반도체 생산 공정 중 클리닝 공정 설비에서, 웨이퍼의 장착 위치를 인식하는 영상 인식 시스템을 제안한다. 제안한 시스템은 웨이퍼의 위치 이탈에 따른 위치오차 발생 시 이를 클리닝 설비에 전달하여, 웨이퍼 클리닝 장비의 파손을 방지하여 시스템의 신뢰성과 경제성을 높이기 위한 것이다. 제안한 방법은 기존의 시스템에서 체스보드 형태의 캘리브레이터를 사용시 발생되는 오차를 줄이기 위하여 방사형 캘리브레이터를 디자인 및 제작하고 이의 매핑합수를 구하는데 있다. 제안한 시스템은 고 신뢰성과 고 정밀의 위치인식 알고리즘을 사용하여, 효율적으로 웨이퍼 인라인 공정에 설치함을 목표로 하며 실험결과 기존의 방법에 비해 충분한 허용 기준 내에서 오차를 검출해내는 좋은 성능을 보여준다.

Keywords

References

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