Journal of Advanced Marine Engineering and Technology

The Korean Society of Marine Engineering (한국마린엔지니어링학회)
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Formation of SiO:CH Ultra Water Repellent Thin Films by Inductively Coupled RF PECVD

  • Yun, Yong-Sup (Division of Marine System Engineering, Korea Maritime University)
  • Received : 2011.03.10
  • Accepted : 2011.05.23
  • Published : 2011.05.31
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Abstract

In this paper, the UWR thin films were prepared by RF PECVD. The relationships between the deposition conditions and the film properties such as morphological and chemical properties of the films were discussed. Moreover, from the analysis of plasma diagnostics using OES, formation mechanism of UWR thin films was discussed.

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References

  1. A. R. Parker and C. R. Lawrence, "Water capture by a desert beetle", Nature, vol. 414, p. 33, 2001. https://doi.org/10.1038/35102108
  2. S. Herminghaus, Europhys. Lett., "Roughnessinduced non-wetting", vol. 52, p. 165, 2000. https://doi.org/10.1209/epl/i2000-00418-8
  3. P. Ball, Nature, "Super-Hydrophobic Surfaces", vol. 400, p. 507, 1999. https://doi.org/10.1038/22883
  4. W. Barthlott and C. Neinhuis, "Purity of the sacred lotus, or escape from contamination in biological surfaces", Planta vol. 202 p. 1, 1997. https://doi.org/10.1007/s004250050096
  5. X. Feng and L. Jiang, "Design and creation of superwetting/antiwetting surfaces", Adv. Mater., vol. 18, p. 3063, 2006. https://doi.org/10.1002/adma.200501961
  6. A. B. D. Cassie and S. Baxter, "Wettability of porous surfaces", Trans. Faraday Soc., vol. 40, p. 546, 1944. https://doi.org/10.1039/tf9444000546
  7. R. Blossey, "Self-cleaning surfaces", Nat. Mater., vol. 2, p. 301, 2003. https://doi.org/10.1038/nmat856
  8. A. Nakajima, K. Hashimoto and T. Watanabe, "Recent studies on super-hydrophobic films", Monatsh. Chem., vol. 132, p. 31, 2001. https://doi.org/10.1007/s007060170142
  9. Y. Liu, L. Mu, B. H. Liu and J. L. Kong, "Controlled switchable surface", Chem. Eur. J., vol. 11, p. 2622, 2005. https://doi.org/10.1002/chem.200400931
  10. I. P. Parkin and R. G. Palgrave, "Self-cleaning coatings", J. Mater. Chem., vol. 15, p. 1689, 2005. https://doi.org/10.1039/b412803f
  11. O. Takai, A. Hozumi and N. Sugimoto, "Coating of transparent water-repellent thin films by plasma-enhanced CVD", J. Non-Cryst. Solids, vol. 218, p. 280, 1997. https://doi.org/10.1016/S0022-3093(97)00168-3
  12. R. N. Wenzel, "Resistance of solid surfaces to wetting by water", Ind. Eng. Chem., vol. 28, p. 988, 1936. https://doi.org/10.1021/ie50320a024
  13. A. B. D. Cassie and S. Baxter, "Wettability of porous surfaces", Trans. Faraday Soc., vol. 40, p. 546, 1944. https://doi.org/10.1039/tf9444000546
  14. K. Teshima, H. Sugimura, Y. Inoue, O. Takai and A. Takano, "Wettability of polyethylene terephthalate substrates modified by a two-step plasma process", Chemical Vapor Deposition, vol. 10, p. 295, 2004. https://doi.org/10.1002/cvde.200304181
  15. G. Socrates, "Infrared characteristic group frequencies", 2nd ed., Wiley, Chichester, UK, p. 188, 1994.
  16. A.M. Almanza-Workman, S. Raghavan, S. Petrovic, B. Gogoi, P. Deymier, D.J. Monk and R. Roop, "Characterization of highly hydrophobic coatings deposited onto pre-oxidized silicon from water dispersible organosilanes", Thin Sold Films vol. 423, p. 77, 2003. https://doi.org/10.1016/S0040-6090(02)00997-5
  17. Y. Inoue and O. Takai, "Spectroscopic studies on preparation of silicon oxide films by PECVD using organosilicon compounds", Plasma Sources Sci. Technol. vol. 5, p. 339, 1996. https://doi.org/10.1088/0963-0252/5/2/033
  18. M. Shimozuma, "Optical emission diagnostics of $H_{2}+CH_{4}$ 50‐Hz-13.56‐MHz plasmas for chemical vapor deposition", J. Appl. Phys. vol. 70, p. 645, 1991. https://doi.org/10.1063/1.349667
  19. A. Mizuike and H. Kawakuchi, "Introduction to analytic chemistry", SangyoTosho, Tokyo, p. 143, 2001 (in Japanese).
  20. A. A. Radzig and B. M. Smirnov, "Reference data on atoms molecules and ions", Spinger-Vgrlag, p. 197, 1985.
  21. P. W. Atkins, "Physical chemistry", 6th ed., Oxford University Press, p. 37, 2001.

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