Journal of the Korean Society for Heat Treatment (열처리공학회지)

The Korean Society for Heat Treatment (한국열처리공학회)
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Effect of Annealing Temperature after Deposition on the Structural, Electrical and Optical Properties of In2O3 Films

증착 후 열처리 온도에 따른 In2O3 박막의 구조적, 전기적, 광학적 특성 변화

  • Lee, Y.J. (School of Materials Science and Engineering, University of Ulsan) ;
  • Lee, H.M. (School of Materials Science and Engineering, University of Ulsan) ;
  • Heo, S.B. (School of Materials Science and Engineering, University of Ulsan) ;
  • Kim, Y.S. (New Optics, R&D Team) ;
  • Chae, J.H. (New Optics, R&D Team) ;
  • Kong, Y.M. (School of Materials Science and Engineering, University of Ulsan) ;
  • Kim, Daeil (School of Materials Science and Engineering, University of Ulsan)
  • 이영진 (울산대학교 첨단소재공학부) ;
  • 이학민 (울산대학교 첨단소재공학부) ;
  • 허성보 (울산대학교 첨단소재공학부) ;
  • 김유성 (뉴옵틱스 기술연구소) ;
  • 채주현 (뉴옵틱스 기술연구소) ;
  • 공영민 (울산대학교 첨단소재공학부) ;
  • 김대일 (울산대학교 첨단소재공학부)
  • Received : 2011.09.27
  • Accepted : 2011.10.20
  • Published : 2011.11.30
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Abstract

We have investigated the structural, electrical and optical properties of $In_2O_3$ thin films deposited by RF magnetron sputtering and then annealed at $150^{\circ}C$ and $300^{\circ}C$ in vacuum. The structural and electrical properties are strongly related to annealing temperature. All the annealed $In_2O_3$ films are grown as a hexagonal wurtzite phase and the largest grain size is observed in the films annealed at $300^{\circ}C$. The sheet resistance decreases with a increase in annealing temperature and $In_2O_3$ film annealed at $300^{\circ}C$ shows the lowest sheet resistance of $174{\Omega}/{\Box}$. The optical transmittance of $In_2O_3$ films in a visible wavelength region also depends on the annealing temperature. The films annealed at $300^{\circ}C$ show higher transmittance of 76% than those of the films prepared in this study.

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References

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