References
- Shiau, J. H., Chen, C-R., and Feltz, C. J.; "An empirical Bayes process monitoring technique for polytomous data," Quality and Reliability Engineering International, 21 : 13-28, 2005. https://doi.org/10.1002/qre.604
- International Organization for Standardization; ISO 13406-2 : 2001(F) Ch 7.20, ISO, 2001.
- Dai, X. L., Hunt, M. A., and Schulze, M. A.; in : Machine Vision Applications in Industrial Inspection XI, Proceedings of SPIE, 5011, Santa Clara, CA, 23-24, 2003.
- Shankar, N. G. and Zhong, Z. W.; "Defect Detection on Semiconductor Wafer Surfaces," Microelectronic Engineering, 77(3-4) : 337-346, 2005. https://doi.org/10.1016/j.mee.2004.12.003
- Ha, C.; "Relationship Between Yield and Cost Considering Repair and Rework for LCD Manufacturing System," Journal of the Korean Institute of Industrial Engineers, 33(3) : 364-372, 2007.
- ICE; Yield and Yield Management, Chapter 3 in Cost Effective IC Manufacturing 1998-1999, Integrated Circuit Engineering Corporation, 1997.
- Shindo, W., Nurani, R. K., and Strojwas, A. J.; "Effects of defect propagation/growth on inline defect-based yield prediction," IEEE Transactions on Semiconductor Manufacturing, 11(4) : 546-551, 1998. https://doi.org/10.1109/66.728550
- Stapper, C. H. and Rosner, R. J.; "Integrated circuit yield management and yield analysis : development and implementation," IEEE Transactions on Semiconductor Manufacturing, 8(2) : 95-102, 1995.
- Stapper, C. H.; "Modeling of defects in integrated circuit photolitho graphic patterns," IBM Journal of Research and Development, 28(4) : 461-475, 1984.
- Milor, L. S.; "Yield modeling based on in-line scanner defect sizing and a circuit's critical area," IEEE Transactions on Semiconductor Manufacturing, 12(1) : 26-35, 1999. https://doi.org/10.1109/66.744517
- Ha, C.; "Effective construction method of defect size distribution using AOI data : application for semiconductor and LCD manufacturing," IE Interfaces, 21(2) : 151-160, 2008.
- Ghosh, S. K., Mukhopadhyay, P., and Lu, J. C.; "Bayesian analysis of zero-inflated regression models," Journal of Statistical Planning and Inference, 136 : 1360-1375, 2006. https://doi.org/10.1016/j.jspi.2004.10.008
- Ha, C., Chang, J. H., and Kim, J. H.; "Estimation of Defect Clustering Parameter Using Markov Chain Monte Carlo," Journal of the Society of Korea Industrial and Systems Engineering, 32(3) : 99-109, 2009.
- Nelson, J. F.; "Multivariate Gamma-Poisson Models," Journal of the American Statistical Association, 80(392) : 828-834, 1985. https://doi.org/10.1080/01621459.1985.10478190
- Piegorsch, W. W.; "Maximum Likelihood Estimation for the Negative Binomial Dispersion Parameter," Biometrics, 46 : 863-867, 1990. https://doi.org/10.2307/2532104