References
- K. Tonooka, H. Bando, and Y. Aiura, Thin Solid Films 445, 327 (2003). https://doi.org/10.1016/S0040-6090(03)01177-5
- G. K. R. Senadeera, K. Nakamura, and T. Kitamura, Appl. Phys. Lett. 83, 5470 (2003). https://doi.org/10.1063/1.1633673
- S. H. Cho, J. Korean Vacuum Soc. 18, 377 (2009). https://doi.org/10.5757/JKVS.2009.18.5.377
- J. S. Lee, G. C. Kim, H. H. Jeon, S. J. Hwangboe, D. H. Kim, C. M. Seong, and M. H. Jeon, J. Korean Vacuum Soc. 17, 23 (2008). https://doi.org/10.5757/JKVS.2008.17.1.023
- M. Lorenz, E. M. Kaidashev, H. von Wenckstern, V. Riede, C. Bundesmann, D. Spemann, G. Benndorf, H. Hochmuth, A. Rahm, H. C. Semmelhack, and M. Grundmann, Solid-State Electron. 47, 2205 (2003). https://doi.org/10.1016/S0038-1101(03)00198-9
- A. Maldonado, S. T. Guerra, M. M. Lira, and M. L. Olvera, Sol. Energ. Mat. Sol. C. 90, 742 (2006). https://doi.org/10.1016/j.solmat.2005.04.011
- K. Ellmer, J. Phys. D: Appl. Phys. 34, 3097 (2001). https://doi.org/10.1088/0022-3727/34/21/301
- S. Major, S. Kumar, M. Bhatnagar, and K. L. Chopra, J. Phys. D: Appl. Phys. 33, R17 (2000). https://doi.org/10.1088/0022-3727/33/4/201
- S. H. Jeong and J. H. Boo, Thin Solid Films 447, 105 (2004). https://doi.org/10.1016/j.tsf.2003.09.031
- R. J. Honga, X. Jianga, G. Heideb, B. Szyszkaa, V. Sittingera, and W. Werner, 249, 461 (2003). https://doi.org/10.1016/S0022-0248(02)02270-4
- J. Mass, P. Bhattacharya, and R. S. Katiyar, Mater. Sci. Eng. B 103, 9 (2003). https://doi.org/10.1016/S0921-5107(03)00127-2
- H. P. Chang, F. H. Wang, J. Y. Wu, C. Y. Kung, and H. W. Liu, Thin Solid Films 518, 7445 (2010). https://doi.org/10.1016/j.tsf.2010.05.020
- W. Yang, Z. Liu a, D. L. Peng, F. Zhang, H. Huang, Y. Xie, and Z. Wua, Appl. Surf. Sci. 255, 5669 (2009). https://doi.org/10.1016/j.apsusc.2008.12.021
- Y. M. Lu, W. S. Hwang, W. Y. Liu, and J. S. Yang, Mater. Chem. Phys. 72, 269 (2001). https://doi.org/10.1016/S0254-0584(01)00450-3
- B. D. Cullity, Elements of X-ray Diffraction, (Addison-Wesley, 1978), 102.
- Y. Igasaki and H. Kanma, Appl. Surf. Sci. 169-170, 508 (2001). https://doi.org/10.1016/S0169-4332(00)00748-0
- H. A. Mohamed, J. Phys. D: Appl. Phys. 40, 4234 (2007). https://doi.org/10.1088/0022-3727/40/14/019
Cited by
- Optical and Electrical Properties of Sputtered ZnO:Al Thin Films with Various Annealing Temperature vol.22, pp.1, 2013, https://doi.org/10.5757/JKVS.2013.22.1.20