반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)

한국반도체디스플레이기술학회 (The Korean Society Of Semiconductor & Display Technology)
권호 표지

유입.유출구 크기 변화에 따른 CNT용 CVD 장비 내의 열 및 유동해석

Flow and heat transfer in a thermal CVD for carbon nanotubes according to variation of the inlet and outlet areas

  • 하다솜 (전북대학교 대학원 기계설계공학과) ;
  • 장영운 (전북대학교 대학원 기계설계공학과) ;
  • 김종석 (전북대학교 공과대학 화학공학부) ;
  • 윤석범 (전북대학교 공과대학 기계설계공학부) ;
  • 임익태 (전북대학교 공과대학 기계설계공학부)
  • Ha, Da-Som (Dept. of Mechanical Design Eng., Graduate School, ChonBuk National Univ.) ;
  • Jang, Young-Woon (Dept. of Mechanical Design Eng., Graduate School, ChonBuk National Univ.) ;
  • Kim, Jong-Seok (School of Chemical Eng. College of Eng., ChonBuk National Univ.) ;
  • Yoon, Suk-Bum (Dept. of Mechanical Design Eng., College of Eng., ChonBuk National Univ.) ;
  • Im, Ik-Tae (Dept. of Mechanical Design Eng., College of Eng., ChonBuk National Univ.)
  • 투고 : 2011.11.17
  • 심사 : 2011.12.15
  • 발행 : 2011.12.31
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초록

Flow and temperature field in reactors are important factors for design of thermal chemical vapor deposition system to grow carbon nanotubes. In this study, effects of the variations of the inlet and outlet areas of the CVD reactor to the flow characteristics and temperature field are numerically analyzed. High temperature of the gas in the entrance region is obtained with slow gas speed resulted from the enlarged inlet area. Variation of the exit area has little effects on the flow field and temperature in the reactor. However the largest area among considered cases gives the highest gas temperature though the differences are small.

키워드

참고문헌

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