Journal of the Semiconductor & Display Technology (반도체디스플레이기술학회지)

The Korean Society Of Semiconductor & Display Technology (한국반도체디스플레이기술학회)
권호 표지

Pressure Distribution by Rubber Roller in Large-area UV Imprinting Lithography Process

대면적 UV 임프린팅 공정에서 고무 롤러에 의한 압력분포

  • Kim, Nam-Woong (School of Mechanical Engineering, Dongyang Mirae University) ;
  • Kim, Kug-Weon (Dept. of Mechanical Engineering, Soonchunhyang University) ;
  • Lee, Woo-Young (School of Mechanical Engineering, Korea University of Technology and Education)
  • 김남웅 (동양미래대학 기계공학부) ;
  • 김국원 (순천향대학교 공과대학 기계공학과) ;
  • 이우영 (한국기술교육대학교 기계정보공학부)
  • Received : 2010.05.31
  • Accepted : 2010.06.15
  • Published : 2010.06.30
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Abstract

In recent years there have been considerable attentions on nanoimprint lithography (NIL) by the display device and semiconductor industry due to its potential abilities that enable cost-effective and high-throughput nanofabrication. Although one of the current major research trends of NIL is large-area patterning, the technical difficulties to keep the uniformity of the residual layer become severer as the imprinting area increases more and more. In this paper we consider the roll-to-plate type imprinting process. In the process a glass mold, which is placed upon the 2nd generation TFT-LCD glass sized substrate(370${\yen}$470 mm), is rolled by a rubber roller to achieve a uniform residual layer. The pressure distribution on the glass mold by rolling of the rubber roller is crucial information to analyze mold deformation, transferred pattern quality, uniformity of residual layer and so forth. In this paper the quantitative pressure distribution induced by rolling of the rubber roller was calculated with finite element analysis under the assumption of Neo-Hookean hyperelastic constitutive relation. Additionally the numerical results were verified by the experiments.

Keywords

References

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