Bulletin of the Korean Chemical Society

Korean Chemical Society (대한화학회)
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Directionality of ο-Phthalaldehyde adsorbed onto H-passivated Si(100) Surface Characterized by NEXAFS and HRPES

  • Kim, Ki-Jeong (Pohang Accelerator Laboratory, POSTECH) ;
  • Yang, Sena (Department of Chemistry, Sookmyung Women's University) ;
  • Kang, Tai-Hee (Pohang Accelerator Laboratory, POSTECH) ;
  • Kim, Bong-Soo (Pohang Accelerator Laboratory, POSTECH) ;
  • Lee, Hang-Gil (Department of Chemistry, Sookmyung Women's University)
  • Received : 2010.04.28
  • Accepted : 2010.05.22
  • Published : 2010.07.20
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Abstract

The electronic and adsorption structure of o-phthalaldehyde (OPA) on the H-Si(100) surface was investigated by using Near Edge X-ray Fine Structure (NEXAFS) and high resolution photoemission spectroscopy (HRPES). We confirmed that the OPA grown on the H-Si(100) surface showed good dependency with about 60 degree tilting angle using NEXAFS and a single O 1s peak by using HRPES. Hydrogen atom passivated on the Si(100) surface was found to be a seed for making one dimensional organic line that uses a chain reaction as the H-Si(100) surface was compared with the hydrogen free Si(100) surface.

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References

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