References
- Hiroshima, Hiroshi and Atobe, Hidemasa, "Homogenity of Residual Layer Thickness in UV Nanoimprint Lithography," Japanese Journal of Applied Physics, Vol. 48, 06FH18-1-06FH18-4, 2009.
- Hiroshima, Hiroshi, "Nanoimprint with Thin and Uniform Residual Layer for Various Pattern Densities," Microelectronic Engineering, Vol. 86, pp. 611- 614, 2009. https://doi.org/10.1016/j.mee.2008.11.076
- Hiroshima, Hiroshi and Komuro, masanori, "UVnanoimprint with the Assistance of Gas Condensation at Atmospheric Environmental Pressure," Journal of Vacuum Science Technology, B. Vol. 25, No. 6, pp. 2333-2336.
- Merino, S., Retolaza, A., Schift, H., and Trabadelo, V., "Stamp deformation and its Influence on Residual Layer Homogeneity in Thermal Nanoimprint Lithography," Microelectronic Engineering, Vol. 85, pp. 877-880 - (mold bend and deformation), 2008. https://doi.org/10.1016/j.mee.2008.01.045
- Shao, J., Ding, Y., Tang, Y., Liu, H., Lu, B., and Cui, D., "A Novel Overlay Process for Imprint Lithography Using Load Release and Alignment Error Pre- Compensation Method," Microelectronic Engineering, Vol. 85, pp.168-174, 2008. https://doi.org/10.1016/j.mee.2007.05.004
- Liu, H., Jiang, W., Ding, Y., Tang, Y., Lu, B., Lan, H., Shi, Y., and Yin, L., "A Novel Load and Demolding Process Control in UV Nanoimprint Lithography," Microelectronic Engineering, Vol. 86, pp. 4-9, 2009. https://doi.org/10.1016/j.mee.2008.08.012
- Sander F. Wuister, Jeroen H. Lammers, Yvonne W. Kruijt-Stegeman, Leendert van der Tempel, and Frits Dijksman, "Squeeze Time Investigations for Step and Flash Imprint Lithography," Microelectronic Engineering, Vol. 86, pp. 681-683, 2009. https://doi.org/10.1016/j.mee.2008.11.093