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Preparation of Boron Doped Fullerene Film by a Thermal Evaporation Technique using Argon Plasma Treatment and Its Electrochemical Application

  • Arie, Arenst Andreas (Battery Research Center, Korea Institute of Science and Technology) ;
  • Jeon, Bup-Ju (Dept. of Energy Resources, Hanbuk University) ;
  • Lee, Joong-Kee (Battery Research Center, Korea Institute of Science and Technology)
  • Received : 2010.05.14
  • Accepted : 2010.06.16
  • Published : 2010.06.30

Abstract

Boron doped fullerene $C_{60}$ ($B:C_{60}$) films were prepared by the thermal evaporation of $C_{60}$ powder using argon plasma treatment. The morphology and structural characteristics of the thin films were investigated by scanning electron microscope (SEM), Fourier transform infra-red spectroscopy (FTIR) and x-ray photo electron spectroscopy (XPS). The electrochemical application of the boron doped fullerene film as a coating layer for silicon anodes in lithium ion batteries was also investigated. Cyclic voltammetry (CV) measurements were applied to the $B:C_{60}$ coated silicon electrodes at a scan rate of $0.05\;mVs^{-1}$. The CV results show that the $B:C_{60}$ coating layer act as a passivation layer with respect to the insertion and extraction of lithium ions into the silicon film electrode.

Keywords

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