References
- Lee, S. H., Lee, Y. H., Lee, K. W., Lee, S. B. and Yim, H. J., 2008, "Analysis of Z-axis Displacement for Precision of a Nano Imprinting Stage," Proc. of the KSME 2008 Spring annual Meeting. p.100.
- Park, I. S., Won, J. J., Yim, H. J. and Jeong, J. I., 2008, "Deformation of a Mold for Large Area UV- nanoimprint Lithography in Alignment and Curing Processes," Proc. of the KSME 2008 Fall Annual Meeting, pp. 1939-1943.
- Lee, J. S., Lee, S. H., Jeong, J. I. and Yim, H. J., 2009, "Analysis of Displacement by External Force of Nano Imprinting Stage," Proc. of the KSME 2009 Spring Annual Meeting, pp. 96-100.
- Lee, K. W., Lee, J. W., Lee, S. H., Lim, S. H., Jeong, J. I. and Yim, H. J., 2008, "Vibration Analysis of a Nano Imprinting Stage Using CAE," Proceedings of the KSNVE Annual Spring Conference. pp. 579-584.
- Lee, S. Y., Kim, S. R., Jeong, J. I. and Yim, H. J., 2009, "A Study on the Improvement of Vibration Analysis of Visual Alignment System Using CAE Method," Transactions of the Korean Society for Noise and Vibration Engineering, Vol. 19, No. 8, pp. 838-842. https://doi.org/10.5050/KSNVN.2009.19.8.838