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$High-J_c\;NdBa_2Cu_3O_{7-{\delta}}$ thin films on $SrTiO_3$(100) substrates prepared by the PLD process

  • Wee, Sung-Hun (Department of Materials Science and Engineering, Seoul National University) ;
  • Moon, Seung-Hyun (Superconductor, Nano & Advanced Materials Co.) ;
  • Yoo, Sang-Im (Department of Materials Science and Engineering, Seoul National University)
  • Published : 2009.05.31

Abstract

We report a successful fabrication of $high-J_c\;NdBa_2Cu_3O_{7-{\delta}}$ (NdBCO) films on $SrTiO_3$(STO) (100) substrates by pulsed laser deposition (PLD) in a relatively wide processing window. Under various oxygen pressures controlled by either 1%$O_2$/Ar mixture gas or pure $O_2$ gas, strongly c-axis oriented NdBCO films were grown at the substrate temperature $(T_s)\;of\;800^{\circ}C$ in 800 mTorr with 1%$O_2$/Ar gas and also in 400 and 800 mTorr with pure $O_2$ gas. These samples exhibited $T_c$ values over 90K and $J_c$ values of $2.8-3.5MA/cm^2$ at 77K in self-field (77K, sf). On the other hand, $J_c$ values over $1A/cm^2$ were obtained at the temperature regions of $700-830^{\circ}C$ in 800 mTorr with 1%$O_2$/Ar gas at those of $750-830^{\circ}C$ in 800 mTorr with pure $O_2$ gas. Unlike previous reports, resent results support that the PLD processing window for high-Jc NdBCO films is not narrow.

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References

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