Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Effect of CH4 addition to the H2 Plasma Excited by HF ICP for H2 Production

고주파유도결합에 의해 여기된 물플라즈마로부터 수소생산에서 메탄가스 첨가효과

  • 김대운 (군산대학교 신소재공학과) ;
  • 정용호 (국가핵융합연구소 응용기술연구실) ;
  • 추원일 (군산대학교 신소재공학과) ;
  • 장수욱 (국가핵융합연구소 응용기술연구실) ;
  • 이봉주 (국가핵융합연구소 응용기술연구실) ;
  • 김영호 (군산대학교 신소재공학과) ;
  • 이승헌 (군산대학교 신소재공학과) ;
  • 권성구 (군산대학교 신소재공학과)
  • Published : 2009.05.01
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Abstract

Hydrogen was produced from water plasma excited in high frequency (HF) inductively coupled tubular reactor. Mass spectrometry was used to monitor gas phase species at various process conditions, Water dissociation rate depend on the process parameters such as ICP power, $H_{2}O$ flow-rate and process pressure, Water dissociation percent in ICP reactor decrease with increase of chamber pressure, while increase with increase of ICP power and $H_{2}O$ flow rate. The effect of $CH_4$ gas addition to a water plasma on the hydrogen production has been studied in a HF ICP tubular reactor. The main roles of $CH_4$ additive gas in $H_{2}O$ plasma are to react with 0 radical for forming $CO_x$ and CHO and resulting additional $H_2$ production. Furthermore, $CH_4$ additives in $H_{2}O$ plasma is to suppress reverse-reaction by scavenging 0 radical. But, process optimization is needed because $CH_4$ addition has some negative effects such as cost increase and $CO_x$ emission.

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References

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